Abstract
Molecular beam epitaxy growth for InSb1-xBix thin films on (100) GaAs substrates is reported. Successful Bi incorporation for 2% is achieved, and up to 70% of the incorporated Bi atoms are at substitutional sites. The effects of growth parameters on Bi incorporation and surface morphology are studied. Strong In and Ga inter-diffusion induced by Bi incorporation is observed and discussed.
Original language | English |
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Journal | Journal of Crystal Growth |
Volume | 378 |
Pages (from-to) | 323-328 |
ISSN | 0022-0248 |
Publication status | Published - 2013 |
Keywords
- Molecular beam epitaxy
- Bismuth compounds
- Semiconducting III–V materials
- Semiconducting ternary compounds