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Molecular beam epitaxy growth of InSb1−xBix thin films

  • Yuxin Song
  • , Shumin Wang
  • , Ivy Saha Roy
  • , Peixiong Shi
  • , Anders Hallen
  • , Zonghe Lai
    • Chalmers University of Technology
    • KTH Royal Institute of Technology

    Research output: Contribution to journalJournal articleResearchpeer-review

    Abstract

    Molecular beam epitaxy growth for InSb1−xBix thin films on (100) GaAs substrates is reported. Successful Bi incorporation for 2% is achieved, and up to 70% of the incorporated Bi atoms are at substitutional sites. The effects of growth parameters on Bi incorporation and surface morphology are studied. Strong In and Ga inter-diffusion induced by Bi incorporation is observed and discussed.
    Original languageEnglish
    JournalJournal of Crystal Growth
    Volume378
    Pages (from-to)323-328
    ISSN0022-0248
    DOIs
    Publication statusPublished - 2013

    Keywords

    • A3. Molecular beam epitaxy
    • B1. Bismuth compounds
    • B2. Semiconducting III–V materials
    • B2. Semiconducting ternary compounds

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