Abstract
Molecular beam epitaxy growth for InSb1−xBix thin films on (100) GaAs substrates is reported. Successful Bi incorporation for 2% is achieved, and up to 70% of the incorporated Bi atoms are at substitutional sites. The effects of growth parameters on Bi incorporation and surface morphology are studied. Strong In and Ga inter-diffusion induced by Bi incorporation is observed and discussed.
| Original language | English |
|---|---|
| Journal | Journal of Crystal Growth |
| Volume | 378 |
| Pages (from-to) | 323-328 |
| ISSN | 0022-0248 |
| DOIs | |
| Publication status | Published - 2013 |
Keywords
- A3. Molecular beam epitaxy
- B1. Bismuth compounds
- B2. Semiconducting III–V materials
- B2. Semiconducting ternary compounds
Fingerprint
Dive into the research topics of 'Molecular beam epitaxy growth of InSb1−xBix thin films'. Together they form a unique fingerprint.Cite this
- APA
- Author
- BIBTEX
- Harvard
- Standard
- RIS
- Vancouver