Modification of pattern formation in doubly resonant second

Peter Lodahl, Morten Bache, M. Saffmann

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Abstract

We analyze pattern formation in doubly resonant intracavity second-harmonic generation in the presence of competing nondegenerate parametric downconversion. We show that for positive cavity detuning of the fundamental frequency the threshold for parametric oscillation is lower than that of transverse, pattern forming instabilities. The parametric oscillation strongly modifies the pattern dynamics found previously in a simplified analysis that neglects parametric instability [Phys. Rev. E 56, 4803 (1997)]. Stationary and dynamic patterns in the presence of parametric oscillation are found numerically
Original languageEnglish
JournalOptics Letters
Volume25
Issue number9
Pages (from-to)654-656
ISSN0146-9592
Publication statusPublished - 2000

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