Modification of pattern formation in doubly resonant second

Peter Lodahl, Morten Bache, M. Saffmann

    Research output: Contribution to journalJournal articleResearchpeer-review


    We analyze pattern formation in doubly resonant intracavity second-harmonic generation in the presence of competing nondegenerate parametric downconversion. We show that for positive cavity detuning of the fundamental frequency the threshold for parametric oscillation is lower than that of transverse, pattern forming instabilities. The parametric oscillation strongly modifies the pattern dynamics found previously in a simplified analysis that neglects parametric instability [Phys. Rev. E 56, 4803 (1997)]. Stationary and dynamic patterns in the presence of parametric oscillation are found numerically
    Original languageEnglish
    JournalOptics Letters
    Issue number9
    Pages (from-to)654-656
    Publication statusPublished - 2000


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