Modeling and simulation of stamp deflections in nanoimprint lithography: Exploiting backside grooves to enhance residual layer thickness uniformity

Hayden Taylor, Kristian Smistrup, Duane Boning

    Research output: Contribution to journalConference articleResearchpeer-review

    Abstract

    We describe a model for the compliance of a nanoimprint stamp etched with a grid of backside grooves. We integrate the model with a fast simulation technique that we have previously demonstrated, to show how etched grooves help reduce the systematic residual layer thickness (RLT) variations that occur when different patterns lie in close proximity on the stamp.
    Original languageEnglish
    JournalMicroelectronic Engineering
    Volume88
    Issue number8
    Pages (from-to)2154-2157
    ISSN0167-9317
    DOIs
    Publication statusPublished - 2011
    Event36th International Conference on Micro- and Nano-Engineering - Genoa, Italy
    Duration: 19 Sep 201022 Sep 2010
    Conference number: 36
    http://www.mne2010.org/

    Conference

    Conference36th International Conference on Micro- and Nano-Engineering
    Number36
    CountryItaly
    CityGenoa
    Period19/09/201022/09/2010
    Internet address

    Keywords

    • Residual layer
    • Pattern dependencies
    • Simulation
    • Protrusion density
    • Nanoimprint lithography

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