Microtome sliced block copolymers as masks for nanolithography

Violetta Shvets, Lars Schulte, Sokol Ndoni

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    Original languageEnglish
    Title of host publicationProceedings of the International Conference on Nanotechnology, Nanomaterials & Thin Films for Energy Applications
    Number of pages1
    Publication date2014
    Publication statusPublished - 2014
    EventInternational Conference on Nanotechnology, Nanomaterials & Thin Films for Energy Applications - University College London, London, United Kingdom
    Duration: 19 Feb 201421 Feb 2014
    Conference number: 1

    Conference

    ConferenceInternational Conference on Nanotechnology, Nanomaterials & Thin Films for Energy Applications
    Number1
    LocationUniversity College London
    CountryUnited Kingdom
    CityLondon
    Period19/02/201421/02/2014

    Cite this

    Shvets, V., Schulte, L., & Ndoni, S. (2014). Microtome sliced block copolymers as masks for nanolithography. In Proceedings of the International Conference on Nanotechnology, Nanomaterials & Thin Films for Energy Applications