Microstructure and Thermoelectric Properties of CrN and CrN/Cr2N Thin Films

M. A. Gharavi*, S. Kerdsongpanya, S. Schmidt, F. Eriksson, N. V. Nong, J. Lu, D. Fournier, L. Belliard, A. le Febvrier, C. Pallier, P. Eklund

*Corresponding author for this work

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Abstract

CrN thin films with an N/Cr ratio of 95% were deposited by reactive magnetron sputtering onto (0 0 0 1) sapphire substrates. X-ray diffraction and pole figure texture analysis show CrN (1 1 1) epitaxial growth in a twin domain fashion. By changing the nitrogen versus argon gas flow mixture and the deposition temperature, thin films with different surface morphologies ranging from grainy rough textures to flat and smooth films were prepared. These parameters can also affect the CrN x system, with the film compound changing between semiconducting CrN and metallic Cr2N through the regulation of the nitrogen content of the gas flow and the deposition temperature at a constant deposition pressure. Thermoelectric measurements (electrical resistivity and Seebeck coefficient), scanning electron microscopy, and transmission electron microscopy imaging confirm the changing electrical resistivity between 0.75 and 300 , the changing Seebeck coefficient values between 140 and 230 , and the differences in surface morphology and microstructure as higher temperatures result in lower electrical resistivity while gas flow mixtures with higher nitrogen content result in single phase cubic CrN.
Original languageEnglish
Article number355302
JournalJournal of Physics D: Applied Physics
Volume51
Issue number35
Number of pages9
ISSN0022-3727
DOIs
Publication statusPublished - 2018

Keywords

  • Magnetron sputtering
  • Thermoelectrics
  • Chromium nitride
  • Seebeck coefficient
  • Thin films

Cite this

Gharavi, M. A., Kerdsongpanya, S., Schmidt, S., Eriksson, F., V. Nong, N., Lu, J., ... Eklund, P. (2018). Microstructure and Thermoelectric Properties of CrN and CrN/Cr2N Thin Films. Journal of Physics D: Applied Physics, 51(35), [355302]. https://doi.org/10.1088/1361- 6463/aad2ef
Gharavi, M. A. ; Kerdsongpanya, S. ; Schmidt, S. ; Eriksson, F. ; V. Nong, N. ; Lu, J. ; Fournier, D. ; Belliard, L. ; Febvrier, A. le ; Pallier, C. ; Eklund, P. / Microstructure and Thermoelectric Properties of CrN and CrN/Cr2N Thin Films. In: Journal of Physics D: Applied Physics. 2018 ; Vol. 51, No. 35.
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title = "Microstructure and Thermoelectric Properties of CrN and CrN/Cr2N Thin Films",
abstract = "CrN thin films with an N/Cr ratio of 95{\%} were deposited by reactive magnetron sputtering onto (0 0 0 1) sapphire substrates. X-ray diffraction and pole figure texture analysis show CrN (1 1 1) epitaxial growth in a twin domain fashion. By changing the nitrogen versus argon gas flow mixture and the deposition temperature, thin films with different surface morphologies ranging from grainy rough textures to flat and smooth films were prepared. These parameters can also affect the CrN x system, with the film compound changing between semiconducting CrN and metallic Cr2N through the regulation of the nitrogen content of the gas flow and the deposition temperature at a constant deposition pressure. Thermoelectric measurements (electrical resistivity and Seebeck coefficient), scanning electron microscopy, and transmission electron microscopy imaging confirm the changing electrical resistivity between 0.75 and 300 , the changing Seebeck coefficient values between 140 and 230 , and the differences in surface morphology and microstructure as higher temperatures result in lower electrical resistivity while gas flow mixtures with higher nitrogen content result in single phase cubic CrN.",
keywords = "Magnetron sputtering, Thermoelectrics, Chromium nitride, Seebeck coefficient, Thin films",
author = "Gharavi, {M. A.} and S. Kerdsongpanya and S. Schmidt and F. Eriksson and {V. Nong}, N. and J. Lu and D. Fournier and L. Belliard and Febvrier, {A. le} and C. Pallier and P. Eklund",
year = "2018",
doi = "10.1088/1361- 6463/aad2ef",
language = "English",
volume = "51",
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Gharavi, MA, Kerdsongpanya, S, Schmidt, S, Eriksson, F, V. Nong, N, Lu, J, Fournier, D, Belliard, L, Febvrier, AL, Pallier, C & Eklund, P 2018, 'Microstructure and Thermoelectric Properties of CrN and CrN/Cr2N Thin Films', Journal of Physics D: Applied Physics, vol. 51, no. 35, 355302. https://doi.org/10.1088/1361- 6463/aad2ef

Microstructure and Thermoelectric Properties of CrN and CrN/Cr2N Thin Films. / Gharavi, M. A. ; Kerdsongpanya, S.; Schmidt, S.; Eriksson, F.; V. Nong, N.; Lu, J.; Fournier, D.; Belliard, L.; Febvrier, A. le ; Pallier, C.; Eklund, P.

In: Journal of Physics D: Applied Physics, Vol. 51, No. 35, 355302, 2018.

Research output: Contribution to journalJournal articleResearchpeer-review

TY - JOUR

T1 - Microstructure and Thermoelectric Properties of CrN and CrN/Cr2N Thin Films

AU - Gharavi, M. A.

AU - Kerdsongpanya, S.

AU - Schmidt, S.

AU - Eriksson, F.

AU - V. Nong, N.

AU - Lu, J.

AU - Fournier, D.

AU - Belliard, L.

AU - Febvrier, A. le

AU - Pallier, C.

AU - Eklund, P.

PY - 2018

Y1 - 2018

N2 - CrN thin films with an N/Cr ratio of 95% were deposited by reactive magnetron sputtering onto (0 0 0 1) sapphire substrates. X-ray diffraction and pole figure texture analysis show CrN (1 1 1) epitaxial growth in a twin domain fashion. By changing the nitrogen versus argon gas flow mixture and the deposition temperature, thin films with different surface morphologies ranging from grainy rough textures to flat and smooth films were prepared. These parameters can also affect the CrN x system, with the film compound changing between semiconducting CrN and metallic Cr2N through the regulation of the nitrogen content of the gas flow and the deposition temperature at a constant deposition pressure. Thermoelectric measurements (electrical resistivity and Seebeck coefficient), scanning electron microscopy, and transmission electron microscopy imaging confirm the changing electrical resistivity between 0.75 and 300 , the changing Seebeck coefficient values between 140 and 230 , and the differences in surface morphology and microstructure as higher temperatures result in lower electrical resistivity while gas flow mixtures with higher nitrogen content result in single phase cubic CrN.

AB - CrN thin films with an N/Cr ratio of 95% were deposited by reactive magnetron sputtering onto (0 0 0 1) sapphire substrates. X-ray diffraction and pole figure texture analysis show CrN (1 1 1) epitaxial growth in a twin domain fashion. By changing the nitrogen versus argon gas flow mixture and the deposition temperature, thin films with different surface morphologies ranging from grainy rough textures to flat and smooth films were prepared. These parameters can also affect the CrN x system, with the film compound changing between semiconducting CrN and metallic Cr2N through the regulation of the nitrogen content of the gas flow and the deposition temperature at a constant deposition pressure. Thermoelectric measurements (electrical resistivity and Seebeck coefficient), scanning electron microscopy, and transmission electron microscopy imaging confirm the changing electrical resistivity between 0.75 and 300 , the changing Seebeck coefficient values between 140 and 230 , and the differences in surface morphology and microstructure as higher temperatures result in lower electrical resistivity while gas flow mixtures with higher nitrogen content result in single phase cubic CrN.

KW - Magnetron sputtering

KW - Thermoelectrics

KW - Chromium nitride

KW - Seebeck coefficient

KW - Thin films

U2 - 10.1088/1361- 6463/aad2ef

DO - 10.1088/1361- 6463/aad2ef

M3 - Journal article

VL - 51

JO - Journal of Physics D: Applied Physics

JF - Journal of Physics D: Applied Physics

SN - 0022-3727

IS - 35

M1 - 355302

ER -