Microstructural gradients in thin hard coatings -- tailor-made

Karen Pantleon, Heinrich Oettel

    Research output: Contribution to journalJournal articleResearchpeer-review

    Abstract

    Microstructural modifications resulting from time dependent variations of the bias voltage during the deposition of thin hard coatings are discussed. TiN-coatings are produced by reactive magnetron sputtering in several modes: (a) stepwise increase of the bias voltage during the deposition, (b) alternating sputtering with and without substrate voltage and (c) pulsed bias voltage. On the basis of X-ray diffraction measurements, it is demonstrated that residual stress gradients and texture gradients can be designed tailor-made. Furthermore, results of microhardness measurements and scratch tests indicate an improvement of the mechanical properties, especially for the application of a pulsed bias voltage. (C) 1997 Elsevier Science S.A.
    Original languageEnglish
    JournalSurface and Coatings Technology
    Volume97
    Issue number1-3
    Pages (from-to)308-312
    ISSN0257-8972
    DOIs
    Publication statusPublished - 1998

    Fingerprint Dive into the research topics of 'Microstructural gradients in thin hard coatings -- tailor-made'. Together they form a unique fingerprint.

    Cite this