Metal-insulator transition in crystalline V2O3 thin films probed at atomic-scale using emission Mössbauer spectroscopy

B. Qi; H. P. Gunnlaugsson; S. Ólafsson; H. P. Gislason; E. B. Thorsteinsson; U. B. Arnalds; R. Mantovan; I. Unzueta l; D. V. Zyabkin; K. Bharuth Ram; K. Johnston; P. B. Krastev; T.E. Mølholt; H. Masenda; A. Tarazaga Martín-Luengo; D. Naidoo; J. Schell

doi:10.1016/j.tsf.2020.138389

Metal-insulator transition in crystalline V2O3 thin films probed at atomic-scale using emission Mössbauer spectroscopy

B. Qi^*
, H. P. Gunnlaugsson
, S. Ólafsson
, H. P. Gislason
, E. B. Thorsteinsson
, U. B. Arnalds
, R. Mantovan
, I. Unzueta l
, D. V. Zyabkin
, K. Bharuth Ram
, K. Johnston
, P. B. Krastev
, T.E. Mølholt
, H. Masenda
, A. Tarazaga Martín-Luengo
, D. Naidoo
, J. Schell

^*Corresponding author for this work

Department of Health Technology

University of Duisburg-Essen
University of Iceland
University of the Witwatersrand
Johannes Kepler University Linz
Bulgarian Academy of Sciences
Ilmenau University of Technology
University of the Basque Country
CERN
Durban University of Technology
Istituto per la Microelettronica e i Microsistemi

Research output: Contribution to journal › Journal article › Research › peer-review

Abstract

Microscopic understanding the metal-to-insulator transition (MIT) in strongly correlated materials is critical to the design and control of modern “beyond silicon” Mott nanodevices. In this work, the local MIT behaviors in single crystalline V2O3 thin films were probed on an atomic scale by online 57Fe emission Mössbauer spectroscopy (eMS) following dilute (

Original language	English
Article number	138389
Journal	Thin Solid Films
Volume	714
Number of pages	11
ISSN	0040-6090
DOIs	https://doi.org/10.1016/j.tsf.2020.138389
Publication status	Published - 2020

Keywords

Metal-insulator transition
Divanadium trioxide
Thin film
Epitaxial strain
Emission mössbauer spectroscopy
Mott nanodevices

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10.1016/j.tsf.2020.138389

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Qi, B., Gunnlaugsson, H. P., Ólafsson, S., Gislason, H. P., Thorsteinsson, E. B., Arnalds, U. B., Mantovan, R., Unzueta l, I., Zyabkin, D. V., Ram, K. B., Johnston, K., Krastev, P. B., Mølholt, T. E., Masenda, H., Martín-Luengo, A. T., Naidoo, D., & Schell, J. (2020). Metal-insulator transition in crystalline V2O3 thin films probed at atomic-scale using emission Mössbauer spectroscopy. Thin Solid Films, 714, Article 138389. https://doi.org/10.1016/j.tsf.2020.138389

@article{0cc1a4cf2a174f0e8e471d9ad1e98af0,

title = "Metal-insulator transition in crystalline V2O3 thin films probed at atomic-scale using emission M{\"o}ssbauer spectroscopy",

abstract = "Microscopic understanding the metal-to-insulator transition (MIT) in strongly correlated materials is critical to the design and control of modern “beyond silicon” Mott nanodevices. In this work, the local MIT behaviors in single crystalline V2O3 thin films were probed on an atomic scale by online 57Fe emission M{\"o}ssbauer spectroscopy (eMS) following dilute (",

keywords = "Metal-insulator transition, Divanadium trioxide, Thin film, Epitaxial strain, Emission m{\"o}ssbauer spectroscopy, Mott nanodevices",

author = "B. Qi and Gunnlaugsson, \{H. P.\} and S. {\'O}lafsson and Gislason, \{H. P.\} and Thorsteinsson, \{E. B.\} and Arnalds, \{U. B.\} and R. Mantovan and \{Unzueta l\}, I. and Zyabkin, \{D. V.\} and Ram, \{K. Bharuth\} and K. Johnston and Krastev, \{P. B.\} and T.E. M{\o}lholt and H. Masenda and Mart{\'i}n-Luengo, \{A. Tarazaga\} and D. Naidoo and J. Schell",

year = "2020",

doi = "10.1016/j.tsf.2020.138389",

language = "English",

volume = "714",

journal = "Thin Solid Films",

issn = "0040-6090",

publisher = "Elsevier",

}

Qi, B, Gunnlaugsson, HP, Ólafsson, S, Gislason, HP, Thorsteinsson, EB, Arnalds, UB, Mantovan, R, Unzueta l, I, Zyabkin, DV, Ram, KB, Johnston, K, Krastev, PB, Mølholt, TE, Masenda, H, Martín-Luengo, AT, Naidoo, D & Schell, J 2020, 'Metal-insulator transition in crystalline V2O3 thin films probed at atomic-scale using emission Mössbauer spectroscopy', Thin Solid Films, vol. 714, 138389. https://doi.org/10.1016/j.tsf.2020.138389

TY - JOUR

T1 - Metal-insulator transition in crystalline V2O3 thin films probed at atomic-scale using emission Mössbauer spectroscopy

AU - Qi, B.

AU - Gunnlaugsson, H. P.

AU - Ólafsson, S.

AU - Gislason, H. P.

AU - Thorsteinsson, E. B.

AU - Arnalds, U. B.

AU - Mantovan, R.

AU - Unzueta l, I.

AU - Zyabkin, D. V.

AU - Ram, K. Bharuth

AU - Johnston, K.

AU - Krastev, P. B.

AU - Mølholt, T.E.

AU - Masenda, H.

AU - Martín-Luengo, A. Tarazaga

AU - Naidoo, D.

AU - Schell, J.

PY - 2020

Y1 - 2020

N2 - Microscopic understanding the metal-to-insulator transition (MIT) in strongly correlated materials is critical to the design and control of modern “beyond silicon” Mott nanodevices. In this work, the local MIT behaviors in single crystalline V2O3 thin films were probed on an atomic scale by online 57Fe emission Mössbauer spectroscopy (eMS) following dilute (

AB - Microscopic understanding the metal-to-insulator transition (MIT) in strongly correlated materials is critical to the design and control of modern “beyond silicon” Mott nanodevices. In this work, the local MIT behaviors in single crystalline V2O3 thin films were probed on an atomic scale by online 57Fe emission Mössbauer spectroscopy (eMS) following dilute (

KW - Metal-insulator transition

KW - Divanadium trioxide

KW - Thin film

KW - Epitaxial strain

KW - Emission mössbauer spectroscopy

KW - Mott nanodevices

U2 - 10.1016/j.tsf.2020.138389

DO - 10.1016/j.tsf.2020.138389

M3 - Journal article

SN - 0040-6090

VL - 714

JO - Thin Solid Films

JF - Thin Solid Films

M1 - 138389

ER -

Metal-insulator transition in crystalline V2O3 thin films probed at atomic-scale using emission Mössbauer spectroscopy

Abstract

Keywords

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