Master origination by 248 nm DUV lithography for plasmonic color generation

Xiaolong Zhu; Ilja Czolkos; Alicia Johansson; Theodor Nielsen; Anders Kristensen

doi:10.1063/5.0046163

Master origination by 248 nm DUV lithography for plasmonic color generation

Xiaolong Zhu^*, Ilja Czolkos, Alicia Johansson, Theodor Nielsen, Anders Kristensen

^*Corresponding author for this work

Department of Health Technology

NIL Technology ApS

Research output: Contribution to journal › Journal article › Research › peer-review

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Abstract

Plasmonic color metasurfaces enable high resolution, ink-free color decoration and sensing devices. This work presents a full solution from design of plasmonic color elements suitable for master origination by 248 nm Deep Ultraviolet (DUV) lithography to production grade manufacture of plasmonic color metasurfaces on plastic substrates. Design of hybrid aluminum disk-hole structures with hybridized multiple resonances, which are controlled by the disk-hole distance, enables plasmonic color generation across the visible spectrum with larger sized nanostructures, above 160 nm. Such larger structures can be defined by 248 nm DUV lithography as a cost-efficient and high throughput alternative to, e.g., electron beam lithography.

Original language	English
Article number	141103
Journal	Applied Physics Letters
Volume	118
Issue number	14
Number of pages	6
ISSN	0003-6951
DOIs	https://doi.org/10.1063/5.0046163
Publication status	Published - 2021

Bibliographical note

Funding Information:
This work was supported by the European Commission through H2020-NMP-PILOTS IZADI-NANO2INDUSTRY (Grant Agreement No. 686165); X.Z. was supported by VILLUM Experiment (Grant No. 17400), funded by VILLUM FONDEN.

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title = "Master origination by 248 nm DUV lithography for plasmonic color generation",

abstract = "Plasmonic color metasurfaces enable high resolution, ink-free color decoration and sensing devices. This work presents a full solution from design of plasmonic color elements suitable for master origination by 248 nm Deep Ultraviolet (DUV) lithography to production grade manufacture of plasmonic color metasurfaces on plastic substrates. Design of hybrid aluminum disk-hole structures with hybridized multiple resonances, which are controlled by the disk-hole distance, enables plasmonic color generation across the visible spectrum with larger sized nanostructures, above 160 nm. Such larger structures can be defined by 248 nm DUV lithography as a cost-efficient and high throughput alternative to, e.g., electron beam lithography. ",

author = "Xiaolong Zhu and Ilja Czolkos and Alicia Johansson and Theodor Nielsen and Anders Kristensen",

note = "Funding Information: This work was supported by the European Commission through H2020-NMP-PILOTS IZADI-NANO2INDUSTRY (Grant Agreement No. 686165); X.Z. was supported by VILLUM Experiment (Grant No. 17400), funded by VILLUM FONDEN. ",

year = "2021",

doi = "10.1063/5.0046163",

language = "English",

volume = "118",

journal = "Applied Physics Letters",

issn = "0003-6951",

publisher = "American Institute of Physics",

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AU - Zhu, Xiaolong

AU - Czolkos, Ilja

AU - Johansson, Alicia

AU - Nielsen, Theodor

AU - Kristensen, Anders

N1 - Funding Information: This work was supported by the European Commission through H2020-NMP-PILOTS IZADI-NANO2INDUSTRY (Grant Agreement No. 686165); X.Z. was supported by VILLUM Experiment (Grant No. 17400), funded by VILLUM FONDEN.

PY - 2021

Y1 - 2021

N2 - Plasmonic color metasurfaces enable high resolution, ink-free color decoration and sensing devices. This work presents a full solution from design of plasmonic color elements suitable for master origination by 248 nm Deep Ultraviolet (DUV) lithography to production grade manufacture of plasmonic color metasurfaces on plastic substrates. Design of hybrid aluminum disk-hole structures with hybridized multiple resonances, which are controlled by the disk-hole distance, enables plasmonic color generation across the visible spectrum with larger sized nanostructures, above 160 nm. Such larger structures can be defined by 248 nm DUV lithography as a cost-efficient and high throughput alternative to, e.g., electron beam lithography.

AB - Plasmonic color metasurfaces enable high resolution, ink-free color decoration and sensing devices. This work presents a full solution from design of plasmonic color elements suitable for master origination by 248 nm Deep Ultraviolet (DUV) lithography to production grade manufacture of plasmonic color metasurfaces on plastic substrates. Design of hybrid aluminum disk-hole structures with hybridized multiple resonances, which are controlled by the disk-hole distance, enables plasmonic color generation across the visible spectrum with larger sized nanostructures, above 160 nm. Such larger structures can be defined by 248 nm DUV lithography as a cost-efficient and high throughput alternative to, e.g., electron beam lithography.

U2 - 10.1063/5.0046163

DO - 10.1063/5.0046163

M3 - Journal article

AN - SCOPUS:85103858018

SN - 0003-6951

VL - 118

JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 14

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ER -

Master origination by 248 nm DUV lithography for plasmonic color generation

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