Maskless UV photolithography process of dual photoresist to fabricate 3D suspended microstructures for pyrolytic carbon microelectrodes

Research output: Contribution to conference › Conference abstract for conference › Research › peer-review

Original language	English
Publication date	2024
Number of pages	1
Publication status	Published - 2024
Event	Polymer Replication Nanoscale 2024 - Technical University of Denmark, Kgs. Lyngby, Denmark Duration: 13 May 2024 → 14 May 2024

Conference	Polymer Replication Nanoscale 2024
Location	Technical University of Denmark
Country/Territory	Denmark
City	Kgs. Lyngby
Period	13/05/2024 → 14/05/2024

Access to Document

@conference{8cea5c1be222439fb47053bf18e4b145,

title = "Maskless UV photolithography process of dual photoresist to fabricate 3D suspended microstructures for pyrolytic carbon microelectrodes",

author = "Mohammad Ramezannezhad and Babak Rezaei and Keller, \{Stephan Sylvest\}",

year = "2024",

language = "English",

note = "Polymer Replication Nanoscale 2024, PRN 2024 ; Conference date: 13-05-2024 Through 14-05-2024",

}

Research output: Contribution to conference › Conference abstract for conference › Research › peer-review

TY - ABST

T1 - Maskless UV photolithography process of dual photoresist to fabricate 3D suspended microstructures for pyrolytic carbon microelectrodes

AU - Ramezannezhad, Mohammad

AU - Rezaei, Babak

AU - Keller, Stephan Sylvest

PY - 2024

Y1 - 2024

M3 - Conference abstract for conference

T2 - Polymer Replication Nanoscale 2024

Y2 - 13 May 2024 through 14 May 2024

ER -