Low atomic number coating for XEUS silicon pore optics

Research output: Contribution to journalJournal article – Annual report year: 2008Researchpeer-review

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Low atomic number coating for XEUS silicon pore optics. / Lumb, D.H.; Cooper-Jensen, Carsten P.; Krumrey, M.; Cibik, L.; Christensen, Finn Erland; Collon, M.; Bavdaz, M.

In: Proceedings of SPIE, the International Society for Optical Engineering, Vol. 7011, 2008.

Research output: Contribution to journalJournal article – Annual report year: 2008Researchpeer-review

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@article{3429ef17ae2c42a2ba45127cedcf50a5,
title = "Low atomic number coating for XEUS silicon pore optics",
abstract = "We describe a set of measurements on coated silicon substrates that are representative of the material to be used for the XEUS High Performance Pore Optics (HPO) technology. X-ray angular reflectance measurements at 2.8 and 8 keV, and energy scans of reflectance at a fixed angle representative of XEUS graze angles are presented. Reflectance is significantly enhanced for low energies when a low atomic number over-coating is applied. Modeling of the layer thicknesses and roughness is used to investigate the dependence on the layer thicknesses, metal and over coat material choices. We compare the low energy effective area increase that could be achieved with an optimized coating design.",
author = "D.H. Lumb and Cooper-Jensen, {Carsten P.} and M. Krumrey and L. Cibik and Christensen, {Finn Erland} and M. Collon and M. Bavdaz",
year = "2008",
doi = "10.1117/12.789664",
language = "English",
volume = "7011",
journal = "Proceedings of SPIE, the International Society for Optical Engineering",
issn = "0277-786X",
publisher = "S P I E - International Society for Optical Engineering",

}

RIS

TY - JOUR

T1 - Low atomic number coating for XEUS silicon pore optics

AU - Lumb, D.H.

AU - Cooper-Jensen, Carsten P.

AU - Krumrey, M.

AU - Cibik, L.

AU - Christensen, Finn Erland

AU - Collon, M.

AU - Bavdaz, M.

PY - 2008

Y1 - 2008

N2 - We describe a set of measurements on coated silicon substrates that are representative of the material to be used for the XEUS High Performance Pore Optics (HPO) technology. X-ray angular reflectance measurements at 2.8 and 8 keV, and energy scans of reflectance at a fixed angle representative of XEUS graze angles are presented. Reflectance is significantly enhanced for low energies when a low atomic number over-coating is applied. Modeling of the layer thicknesses and roughness is used to investigate the dependence on the layer thicknesses, metal and over coat material choices. We compare the low energy effective area increase that could be achieved with an optimized coating design.

AB - We describe a set of measurements on coated silicon substrates that are representative of the material to be used for the XEUS High Performance Pore Optics (HPO) technology. X-ray angular reflectance measurements at 2.8 and 8 keV, and energy scans of reflectance at a fixed angle representative of XEUS graze angles are presented. Reflectance is significantly enhanced for low energies when a low atomic number over-coating is applied. Modeling of the layer thicknesses and roughness is used to investigate the dependence on the layer thicknesses, metal and over coat material choices. We compare the low energy effective area increase that could be achieved with an optimized coating design.

U2 - 10.1117/12.789664

DO - 10.1117/12.789664

M3 - Journal article

VL - 7011

JO - Proceedings of SPIE, the International Society for Optical Engineering

JF - Proceedings of SPIE, the International Society for Optical Engineering

SN - 0277-786X

ER -