TY - JOUR
T1 - Low atomic number coating for XEUS silicon pore optics
AU - Lumb, D.H.
AU - Cooper-Jensen, Carsten P.
AU - Krumrey, M.
AU - Cibik, L.
AU - Christensen, Finn Erland
AU - Collon, M.
AU - Bavdaz, M.
PY - 2008
Y1 - 2008
N2 - We describe a set of measurements on coated silicon substrates that are representative of the material to be used for the XEUS High Performance Pore Optics (HPO) technology. X-ray angular reflectance measurements at 2.8 and 8 keV, and energy scans of reflectance at a fixed angle representative of XEUS graze angles are presented. Reflectance is significantly enhanced for low energies when a low atomic number over-coating is applied. Modeling of the layer thicknesses and roughness is used to investigate the dependence on the layer thicknesses, metal and over coat material choices. We compare the low energy effective area increase that could be achieved with an optimized coating design.
AB - We describe a set of measurements on coated silicon substrates that are representative of the material to be used for the XEUS High Performance Pore Optics (HPO) technology. X-ray angular reflectance measurements at 2.8 and 8 keV, and energy scans of reflectance at a fixed angle representative of XEUS graze angles are presented. Reflectance is significantly enhanced for low energies when a low atomic number over-coating is applied. Modeling of the layer thicknesses and roughness is used to investigate the dependence on the layer thicknesses, metal and over coat material choices. We compare the low energy effective area increase that could be achieved with an optimized coating design.
U2 - 10.1117/12.789664
DO - 10.1117/12.789664
M3 - Journal article
SN - 1605-7422
VL - 7011
JO - Progress in Biomedical Optics and Imaging - Proceedings of SPIE
JF - Progress in Biomedical Optics and Imaging - Proceedings of SPIE
ER -