Laser lithography on resist bi-layer for nanoelectromechanical systems prototyping

Esko Sebastian Forsén, P. Carlberg, L. Montelius, Anja Boisen

Research output: Contribution to journal › Journal article › Research › peer-review

Original language	English
Journal	Microelectronic Engineering
Volume	73–74
Pages (from-to)	491–495
ISSN	0167-9317
Publication status	Published - 2004

Cite this

@article{59bd35b4c3654510b72619ebe42a2645,

title = "Laser lithography on resist bi-layer for nanoelectromechanical systems prototyping",

author = "Fors{\'e}n, {Esko Sebastian} and P. Carlberg and L. Montelius and Anja Boisen",

year = "2004",

language = "English",

volume = "73–74",

pages = "491–495",

journal = "Microelectronic Engineering",

issn = "0167-9317",

publisher = "Elsevier",

}