TY - JOUR
T1 - Laser direct etching of silicon on oxide for rapid prototyping
AU - Mullenborn, Matthias
AU - Heschel, Matthias
AU - Larsen, Ulrik Darling
AU - Dirac, Paul Andreas Holger
AU - Bouwstra, Siebe
PY - 1996
Y1 - 1996
N2 - Structures have been etched in poly-silicon and amorphous silicon deposited on silicon oxide by laser direct writing. These patterns can be written with a high resolution and transferred to the underlying material via reactive ion etching. Three-dimensional structures can be obtained by multiple exposure of the silicon mask. Due to the fast turnaround time of direct writing processes, this technique can be applied for rapid prototyping of large-scale structures.
AB - Structures have been etched in poly-silicon and amorphous silicon deposited on silicon oxide by laser direct writing. These patterns can be written with a high resolution and transferred to the underlying material via reactive ion etching. Three-dimensional structures can be obtained by multiple exposure of the silicon mask. Due to the fast turnaround time of direct writing processes, this technique can be applied for rapid prototyping of large-scale structures.
U2 - 10.1088/0960-1317/6/1/009
DO - 10.1088/0960-1317/6/1/009
M3 - Journal article
SN - 0960-1317
VL - 6
SP - 49
EP - 51
JO - Journal of Micromechanics and Microengineering
JF - Journal of Micromechanics and Microengineering
IS - 1
ER -