Abstract
The reliable fabrication of vertically stacked transition metal dichalcogenide (TMD) heterostructures with clean, well-defined interfaces is essential for next-generation optoelectronic and quantum technologies. Here, we demonstrate a fully transfer-free synthesis route for WS2/MoS2 heterostructures by combining pulsed laser deposition (PLD)
of oxygen-deficient MoO3−x and WO3−x thin films with high-temperature sulfurization. Oxygen vacancies in the reduced oxides act as reactive sulfur incorporation sites, enabling efficient conversion into a crystalline monolayer of MoS2 and few-layer WS2. We compare two routes direct sulfurization of an in situ WO3−x/MoO3−x bilayer and a sequential process in which WO3−x is deposited onto pre-formed MoS2. Both approaches yield vertically stacked WS2/MoS2 heterostructures with clean interfaces and strong interlayer coupling; however, the direct bilayer conversion produces more uniform stacking and better structural quality. This vacancy-driven oxide conversion strategy provides scalable control over layer thickness, morphology, and interfacial sharpness while avoiding polymer residues and the mechanical damage inherent to transfer-based assembly. These results establish oxygen-deficient metal oxides as versatile solid-state precursors for the growth of high-quality TMD heterostructures suitable for advanced photonic, electronic, and quantum devices.
of oxygen-deficient MoO3−x and WO3−x thin films with high-temperature sulfurization. Oxygen vacancies in the reduced oxides act as reactive sulfur incorporation sites, enabling efficient conversion into a crystalline monolayer of MoS2 and few-layer WS2. We compare two routes direct sulfurization of an in situ WO3−x/MoO3−x bilayer and a sequential process in which WO3−x is deposited onto pre-formed MoS2. Both approaches yield vertically stacked WS2/MoS2 heterostructures with clean interfaces and strong interlayer coupling; however, the direct bilayer conversion produces more uniform stacking and better structural quality. This vacancy-driven oxide conversion strategy provides scalable control over layer thickness, morphology, and interfacial sharpness while avoiding polymer residues and the mechanical damage inherent to transfer-based assembly. These results establish oxygen-deficient metal oxides as versatile solid-state precursors for the growth of high-quality TMD heterostructures suitable for advanced photonic, electronic, and quantum devices.
| Original language | English |
|---|---|
| Journal | Applied Surface Science |
| Number of pages | 32 |
| ISSN | 0169-4332 |
| Publication status | Accepted/In press - 2026 |
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