Large Area Three-Dimensional Photonic Crystal Membranes: Single-Run Fabrication and Applications with Embedded Planar Defects

Bingdong Chang*, Chen Zhou, Abebe Tilahun Tarekegne, Yuanqing Yang, Ding Zhao, Flemming Jensen, Jörg Hübner, Henri Jansen

*Corresponding author for this work

Research output: Contribution to journalJournal articleResearchpeer-review

26 Downloads (Pure)

Abstract

Three-dimensional photonic crystals (3D PhCs) enable light manipulations in all three spatial dimensions, however, real world applications are still faced with challenges in fabrication. Here, a facile fabrication strategy for 3D silicon PhCs with a simple cubic (SC) lattice structure is presented, which exhibits a complete photonic bandgap at near-infrared wavelengths of around 1100 nm. The fabrication process is composed of standard deep ultra-violet stepper lithography, followed by a single-run modified plasma etch process.
By applying a direct dry etch release step at the end of the 3D structural etch process, the fabricated 3D PhCs can be released and transferred in the form of a membrane onto other substrates such as glass, polymers, or even substrates with engineered surface. The thickness of the demonstrated membranes is around 2 μm and the size can be up to a few millimeters. A high reflectivity is observed at the stop band frequency, and a planar defect is introduced during the etching process resulting in an optical resonance mode with a small linewidth of around 30 nm. The structure constitutes an optical bandpass filter and can be used as a sensor for organic solvents.
Original languageEnglish
Article number1801176
JournalAdvanced Optical Materials
Volume7
Issue number2
Number of pages9
ISSN2195-1071
DOIs
Publication statusPublished - 2019

Keywords

  • #D photonic crystals
  • DREM process
  • Planar cavities
  • Plasma etching
  • Silicon

Cite this

@article{da5fc7f7989442029ed744979577fec0,
title = "Large Area Three-Dimensional Photonic Crystal Membranes: Single-Run Fabrication and Applications with Embedded Planar Defects",
abstract = "Three-dimensional photonic crystals (3D PhCs) enable light manipulations in all three spatial dimensions, however, real world applications are still faced with challenges in fabrication. Here, a facile fabrication strategy for 3D silicon PhCs with a simple cubic (SC) lattice structure is presented, which exhibits a complete photonic bandgap at near-infrared wavelengths of around 1100 nm. The fabrication process is composed of standard deep ultra-violet stepper lithography, followed by a single-run modified plasma etch process. By applying a direct dry etch release step at the end of the 3D structural etch process, the fabricated 3D PhCs can be released and transferred in the form of a membrane onto other substrates such as glass, polymers, or even substrates with engineered surface. The thickness of the demonstrated membranes is around 2 μm and the size can be up to a few millimeters. A high reflectivity is observed at the stop band frequency, and a planar defect is introduced during the etching process resulting in an optical resonance mode with a small linewidth of around 30 nm. The structure constitutes an optical bandpass filter and can be used as a sensor for organic solvents.",
keywords = "#D photonic crystals, DREM process, Planar cavities, Plasma etching, Silicon",
author = "Bingdong Chang and Chen Zhou and Tarekegne, {Abebe Tilahun} and Yuanqing Yang and Ding Zhao and Flemming Jensen and J{\"o}rg H{\"u}bner and Henri Jansen",
year = "2019",
doi = "10.1002/adom.201801176",
language = "English",
volume = "7",
journal = "Advanced Optical Materials",
issn = "2195-1071",
publisher = "Wiley - V C H Verlag GmbH & Co. KGaA",
number = "2",

}

Large Area Three-Dimensional Photonic Crystal Membranes: Single-Run Fabrication and Applications with Embedded Planar Defects. / Chang, Bingdong; Zhou, Chen; Tarekegne, Abebe Tilahun; Yang, Yuanqing; Zhao, Ding; Jensen, Flemming; Hübner, Jörg; Jansen, Henri.

In: Advanced Optical Materials, Vol. 7, No. 2, 1801176, 2019.

Research output: Contribution to journalJournal articleResearchpeer-review

TY - JOUR

T1 - Large Area Three-Dimensional Photonic Crystal Membranes: Single-Run Fabrication and Applications with Embedded Planar Defects

AU - Chang, Bingdong

AU - Zhou, Chen

AU - Tarekegne, Abebe Tilahun

AU - Yang, Yuanqing

AU - Zhao, Ding

AU - Jensen, Flemming

AU - Hübner, Jörg

AU - Jansen, Henri

PY - 2019

Y1 - 2019

N2 - Three-dimensional photonic crystals (3D PhCs) enable light manipulations in all three spatial dimensions, however, real world applications are still faced with challenges in fabrication. Here, a facile fabrication strategy for 3D silicon PhCs with a simple cubic (SC) lattice structure is presented, which exhibits a complete photonic bandgap at near-infrared wavelengths of around 1100 nm. The fabrication process is composed of standard deep ultra-violet stepper lithography, followed by a single-run modified plasma etch process. By applying a direct dry etch release step at the end of the 3D structural etch process, the fabricated 3D PhCs can be released and transferred in the form of a membrane onto other substrates such as glass, polymers, or even substrates with engineered surface. The thickness of the demonstrated membranes is around 2 μm and the size can be up to a few millimeters. A high reflectivity is observed at the stop band frequency, and a planar defect is introduced during the etching process resulting in an optical resonance mode with a small linewidth of around 30 nm. The structure constitutes an optical bandpass filter and can be used as a sensor for organic solvents.

AB - Three-dimensional photonic crystals (3D PhCs) enable light manipulations in all three spatial dimensions, however, real world applications are still faced with challenges in fabrication. Here, a facile fabrication strategy for 3D silicon PhCs with a simple cubic (SC) lattice structure is presented, which exhibits a complete photonic bandgap at near-infrared wavelengths of around 1100 nm. The fabrication process is composed of standard deep ultra-violet stepper lithography, followed by a single-run modified plasma etch process. By applying a direct dry etch release step at the end of the 3D structural etch process, the fabricated 3D PhCs can be released and transferred in the form of a membrane onto other substrates such as glass, polymers, or even substrates with engineered surface. The thickness of the demonstrated membranes is around 2 μm and the size can be up to a few millimeters. A high reflectivity is observed at the stop band frequency, and a planar defect is introduced during the etching process resulting in an optical resonance mode with a small linewidth of around 30 nm. The structure constitutes an optical bandpass filter and can be used as a sensor for organic solvents.

KW - #D photonic crystals

KW - DREM process

KW - Planar cavities

KW - Plasma etching

KW - Silicon

U2 - 10.1002/adom.201801176

DO - 10.1002/adom.201801176

M3 - Journal article

VL - 7

JO - Advanced Optical Materials

JF - Advanced Optical Materials

SN - 2195-1071

IS - 2

M1 - 1801176

ER -