Large area negative ion source based on matrix ECR cells for fast silicon etching

Research output: Chapter in Book/Report/Conference proceeding › Conference abstract in proceedings › Research › peer-review

Original language	English
Title of host publication	Proceedings
Publication date	2009
Pages	49-50
Publication status	Published - 2009
Event	31st International Symposium on Dry Process - Busan, Korea, Republic of Duration: 24 Sept 2009 → 25 Sept 2009 http://www.plasma.engg.nagoya-u.ac.jp/dps2009/

Conference	31st International Symposium on Dry Process
Country/Territory	Korea, Republic of
City	Busan
Period	24/09/2009 → 25/09/2009
Internet address	http://www.plasma.engg.nagoya-u.ac.jp/dps2009/

Keywords

@inbook{a3d882f18b3d4807af28ae49fe4979a0,

title = "Large area negative ion source based on matrix ECR cells for fast silicon etching",

keywords = "Plasma processing, Fusion energy, Fusionsenergi, Plasmaprocessering",

author = "Eugen Stamate and A. Lacoste",

year = "2009",

language = "English",

pages = "49--50",

booktitle = "Proceedings",

note = "31st International Symposium on Dry Process, DPS 2009 ; Conference date: 24-09-2009 Through 25-09-2009",

url = "http://www.plasma.engg.nagoya-u.ac.jp/dps2009/",

}

TY - ABST

T1 - Large area negative ion source based on matrix ECR cells for fast silicon etching

AU - Stamate, Eugen

AU - Lacoste, A.

PY - 2009

Y1 - 2009

KW - Plasma processing

KW - Fusion energy

KW - Fusionsenergi

KW - Plasmaprocessering

M3 - Conference abstract in proceedings

SP - 49

EP - 50

BT - Proceedings

T2 - 31st International Symposium on Dry Process

Y2 - 24 September 2009 through 25 September 2009

ER -