Large area negative ion source based on matrix ECR cells for fast silicon etching

Eugen Stamate, A. Lacoste

    Research output: Chapter in Book/Report/Conference proceedingConference abstract in proceedingsResearchpeer-review

    Original languageEnglish
    Title of host publicationProceedings
    Publication date2009
    Pages49-50
    Publication statusPublished - 2009
    Event31st International Symposium on Dry Process - Busan, Korea, Republic of
    Duration: 24 Sep 200925 Sep 2009
    http://www.plasma.engg.nagoya-u.ac.jp/dps2009/

    Conference

    Conference31st International Symposium on Dry Process
    CountryKorea, Republic of
    CityBusan
    Period24/09/200925/09/2009
    Internet address

    Keywords

    • Plasma processing
    • Fusion energy

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