Kinetic Study of the Chemical Vapor Deposition of Tantalum in Long Narrow Channels

James Atwoki Mugabi, Søren Eriksen, Irina Petrushina, Erik Christensen, Niels J. Bjerrum

Research output: Contribution to journalJournal articleResearchpeer-review


A kinetic study of the chemical vapor deposition of tantalum in long narrow channels is done to optimize the industrial process for the manufacture of tantalum coated plate heat exchangers. The developed model fits well at temperatures between 750 and 850 °C, and in the pressure range of25–990 mbar. According to the model, the predominant tantalum growth species is TaCl3. The temperature is shown to have a pronounced effect onthe morphology and rate of deposition of the tantalum and an apparent change in deposition mechanism occurs between 850–900 °C, resulting in the deposition rate at 900 °C being lower than both 850 and 950 °C.
Original languageEnglish
JournalAdvanced Materials Interfaces
Issue number14
Number of pages9
Publication statusPublished - 2016


  • CVD of tantalum; modeling of CVD
  • Morphology of tantalum CVD
  • Temperature dependence of CVD

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