Abstract
An apparatus (900) and methods are disclosed for ion beam extraction. In an implementation, the apparatus includes a plasma source (or plasma) (802) and an ion extractor (804). The plasma source is adapted to generate ions and the ion extractor is immersed in the plasma source to extract a fraction of the generated ions. The ion extractor is surrounded by a space charge (810) formed at least in part by the extracted ions. The ion extractor includes a biased electrode (806) forming an interface with an insulator (808). The interface is customized to form a strongly curved potential distribution (812) in the space-charge surrounding the ion extractor. The strongly curved potential distribution focuses the extracted ions towards an opening (814) on a surface of the biased electrode thereby resulting in an ion beam.
| Original language | English |
|---|---|
| Patent number | WO2010040805 |
| Filing date | 15/04/2010 |
| Publication status | Published - 2010 |
Bibliographical note
Patent:No.: EP2175469
Keywords
- Plasma processing
- Fusion energy
Fingerprint
Dive into the research topics of 'Ion Beam Extraction by Discrete Ion Focusing'. Together they form a unique fingerprint.Cite this
- APA
- Author
- BIBTEX
- Harvard
- Standard
- RIS
- Vancouver