Ion-beam deposited platinum as electrical contacting material in operando electron microscopy experiments at elevated temperatures

Søren Bredmose Simonsen*, Zhongtao Ma, Elisabeth Mariegaard, Salvatore De Angelis, Waynah Lou Dacayan, Kristian Speranza Mølhave, Christodoulos Chatzichristodoulou

*Corresponding author for this work

Research output: Contribution to journalJournal articleResearchpeer-review

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Abstract

Establishing a stable and well conducting contacting material is critical for operando electron microscopy experiments of electrical and electrochemical devices at elevated temperatures. In this contribution, the nanostructure and electrical conductivity of ion beam deposited Pt are investigated both in vacuum and in oxygen as a function of temperature. Its microstructure is relatively stable up to a temperature of approx. 800°C and up to an applied current density of approx. 100 kA/cm2. Its conductivity increases with temperature, attributed to densification, with changes in the hydrocarbon matrix being less important. Recommendations are provided with respect to the Pt deposition parameters in terms of maximizing stability and minimizing electrical resistance.

Research Highlights:
•It is feasible to use ion beam deposited Pt as electrical contacting material in operando electron microscopy.
•The deposited Pt is relatively stable up to 800°C and approx. 100 kA/cm2.
•The resistivity can be reduced by increasing the applied ion current during deposition and by thermal annealing at a temperature of 500°C in a few mbar of oxygen.
Original languageEnglish
JournalMicroscopy Research and Technique
Volume86
Issue number8
Pages (from-to)1003-1011
Number of pages9
ISSN1059-910X
DOIs
Publication statusPublished - 2023

Bibliographical note

This project has received funding from the European Research Council (ERC) under the European Union's Horizon 2020 research and innovation programme (grant agreement No. 850850).

Keywords

  • Conductivity
  • Electrical measurements
  • Ion-beam deposited Pt
  • Operando electron microscopy
  • Resistance

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