Ion-beam deposited platinum as electrical contacting material in operando electron microscopy experiments at elevated temperatures

Søren Bredmose Simonsen; Zhongtao Ma; Elisabeth Mariegaard; Salvatore De Angelis; Waynah Lou Dacayan; Kristian Speranza Mølhave; Christodoulos Chatzichristodoulou

doi:10.1002/jemt.24373

Ion-beam deposited platinum as electrical contacting material in operando electron microscopy experiments at elevated temperatures

Søren Bredmose Simonsen^*, Zhongtao Ma, Elisabeth Mariegaard, Salvatore De Angelis, Waynah Lou Dacayan, Kristian Speranza Mølhave, Christodoulos Chatzichristodoulou

^*Corresponding author for this work

Research output: Contribution to journal › Journal article › Research › peer-review

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Abstract

Establishing a stable and well conducting contacting material is critical for operando electron microscopy experiments of electrical and electrochemical devices at elevated temperatures. In this contribution, the nanostructure and electrical conductivity of ion beam deposited Pt are investigated both in vacuum and in oxygen as a function of temperature. Its microstructure is relatively stable up to a temperature of approx. 800°C and up to an applied current density of approx. 100 kA/cm². Its conductivity increases with temperature, attributed to densification, with changes in the hydrocarbon matrix being less important. Recommendations are provided with respect to the Pt deposition parameters in terms of maximizing stability and minimizing electrical resistance.

Research Highlights:
•It is feasible to use ion beam deposited Pt as electrical contacting material in operando electron microscopy.
•The deposited Pt is relatively stable up to 800°C and approx. 100 kA/cm².
•The resistivity can be reduced by increasing the applied ion current during deposition and by thermal annealing at a temperature of 500°C in a few mbar of oxygen.

Original language	English
Journal	Microscopy Research and Technique
Volume	86
Issue number	8
Pages (from-to)	1003-1011
Number of pages	9
ISSN	1059-910X
DOIs	https://doi.org/10.1002/jemt.24373
Publication status	Published - 2023

Bibliographical note

This project has received funding from the European Research Council (ERC) under the European Union's Horizon 2020 research and innovation programme (grant agreement No. 850850).

Keywords

Conductivity
Electrical measurements
Ion-beam deposited Pt
Operando electron microscopy
Resistance

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@article{3db01887c4b249629885b8c050a64e71,

title = "Ion-beam deposited platinum as electrical contacting material in operando electron microscopy experiments at elevated temperatures",

abstract = "Establishing a stable and well conducting contacting material is critical for operando electron microscopy experiments of electrical and electrochemical devices at elevated temperatures. In this contribution, the nanostructure and electrical conductivity of ion beam deposited Pt are investigated both in vacuum and in oxygen as a function of temperature. Its microstructure is relatively stable up to a temperature of approx. 800°C and up to an applied current density of approx. 100 kA/cm2. Its conductivity increases with temperature, attributed to densification, with changes in the hydrocarbon matrix being less important. Recommendations are provided with respect to the Pt deposition parameters in terms of maximizing stability and minimizing electrical resistance. Research Highlights: •It is feasible to use ion beam deposited Pt as electrical contacting material in operando electron microscopy. •The deposited Pt is relatively stable up to 800°C and approx. 100 kA/cm2. •The resistivity can be reduced by increasing the applied ion current during deposition and by thermal annealing at a temperature of 500°C in a few mbar of oxygen.",

keywords = "Conductivity, Electrical measurements, Ion-beam deposited Pt, Operando electron microscopy, Resistance",

author = "Simonsen, {S{\o}ren Bredmose} and Zhongtao Ma and Elisabeth Mariegaard and {De Angelis}, Salvatore and Dacayan, {Waynah Lou} and M{\o}lhave, {Kristian Speranza} and Christodoulos Chatzichristodoulou",

note = "This project has received funding from the European Research Council (ERC) under the European Union's Horizon 2020 research and innovation programme (grant agreement No. 850850).",

year = "2023",

doi = "10.1002/jemt.24373",

language = "English",

volume = "86",

pages = "1003--1011",

journal = "Microscopy Research and Technique",

issn = "1059-910X",

publisher = "JohnWiley & Sons, Inc.",

number = "8",

}

TY - JOUR

T1 - Ion-beam deposited platinum as electrical contacting material in operando electron microscopy experiments at elevated temperatures

AU - Simonsen, Søren Bredmose

AU - Ma, Zhongtao

AU - Mariegaard, Elisabeth

AU - De Angelis, Salvatore

AU - Dacayan, Waynah Lou

AU - Mølhave, Kristian Speranza

AU - Chatzichristodoulou, Christodoulos

N1 - This project has received funding from the European Research Council (ERC) under the European Union's Horizon 2020 research and innovation programme (grant agreement No. 850850).

PY - 2023

Y1 - 2023

N2 - Establishing a stable and well conducting contacting material is critical for operando electron microscopy experiments of electrical and electrochemical devices at elevated temperatures. In this contribution, the nanostructure and electrical conductivity of ion beam deposited Pt are investigated both in vacuum and in oxygen as a function of temperature. Its microstructure is relatively stable up to a temperature of approx. 800°C and up to an applied current density of approx. 100 kA/cm2. Its conductivity increases with temperature, attributed to densification, with changes in the hydrocarbon matrix being less important. Recommendations are provided with respect to the Pt deposition parameters in terms of maximizing stability and minimizing electrical resistance. Research Highlights: •It is feasible to use ion beam deposited Pt as electrical contacting material in operando electron microscopy. •The deposited Pt is relatively stable up to 800°C and approx. 100 kA/cm2. •The resistivity can be reduced by increasing the applied ion current during deposition and by thermal annealing at a temperature of 500°C in a few mbar of oxygen.

AB - Establishing a stable and well conducting contacting material is critical for operando electron microscopy experiments of electrical and electrochemical devices at elevated temperatures. In this contribution, the nanostructure and electrical conductivity of ion beam deposited Pt are investigated both in vacuum and in oxygen as a function of temperature. Its microstructure is relatively stable up to a temperature of approx. 800°C and up to an applied current density of approx. 100 kA/cm2. Its conductivity increases with temperature, attributed to densification, with changes in the hydrocarbon matrix being less important. Recommendations are provided with respect to the Pt deposition parameters in terms of maximizing stability and minimizing electrical resistance. Research Highlights: •It is feasible to use ion beam deposited Pt as electrical contacting material in operando electron microscopy. •The deposited Pt is relatively stable up to 800°C and approx. 100 kA/cm2. •The resistivity can be reduced by increasing the applied ion current during deposition and by thermal annealing at a temperature of 500°C in a few mbar of oxygen.

KW - Conductivity

KW - Electrical measurements

KW - Ion-beam deposited Pt

KW - Operando electron microscopy

KW - Resistance

UR - https://doi.org/10.11583/DTU.23549106.v1

U2 - 10.1002/jemt.24373

DO - 10.1002/jemt.24373

M3 - Journal article

C2 - 37337939

SN - 1059-910X

VL - 86

SP - 1003

EP - 1011

JO - Microscopy Research and Technique

JF - Microscopy Research and Technique

IS - 8

ER -

Ion-beam deposited platinum as electrical contacting material in operando electron microscopy experiments at elevated temperatures

Abstract

Bibliographical note

Keywords

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