Investigation of the ion dose non-uniformity caused by sheath lens focusing affect on silicon wafers

N. Holtzer, Eugen Stamate, H. Sugai

Research output: Chapter in Book/Report/Conference proceedingConference abstract in proceedingsResearchpeer-review

Original languageEnglish
Title of host publicationProceedings of the 27th International Symposium on Dry Process (DPS)
Number of pages2
Publication date2005
Pages247-248
Publication statusPublished - 2005
Externally publishedYes
Event27th International Symposium on Dry Process (DPS) - Jeju, Korea, Democratic People's Republic of
Duration: 1 Jan 2005 → …

Conference

Conference27th International Symposium on Dry Process (DPS)
CountryKorea, Democratic People's Republic of
CityJeju
Period01/01/2005 → …

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