Investigation of the ion dose non-uniformity caused by sheath-lens focusing effect on silicon wafers

N. Holtzer (Invited author), Eugen Stamate (Invited author), H. Toyoda (Invited author), H. Sugai (Invited author)

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Original language	English
Journal	Thin Solid Films
Volume	515
Pages (from-to)	4887-4891
ISSN	0040-6090
DOIs	https://doi.org/10.1016/j.tsf.2006.10.099
Publication status	Published - 2007
Event	3rd International Symposium on Dry Process - DPS 2005 - Jeju, Korea, Republic of Duration: 28 Nov 2005 → 30 Nov 2005

Conference	3rd International Symposium on Dry Process - DPS 2005
Country/Territory	Korea, Republic of
City	Jeju
Period	28/11/2005 → 30/11/2005

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title = "Investigation of the ion dose non-uniformity caused by sheath-lens focusing effect on silicon wafers",

keywords = "Energiteknologier p{\aa} vej",

author = "N. Holtzer and Eugen Stamate and H. Toyoda and H. Sugai",

year = "2007",

doi = "10.1016/j.tsf.2006.10.099",

language = "English",

volume = "515",

pages = "4887--4891",

journal = "Thin Solid Films",

issn = "0040-6090",

publisher = "Elsevier",

note = "3rd International Symposium on Dry Process - DPS 2005 ; Conference date: 28-11-2005 Through 30-11-2005",

}

TY - GEN

T1 - Investigation of the ion dose non-uniformity caused by sheath-lens focusing effect on silicon wafers

AU - Holtzer, N.

AU - Stamate, Eugen

AU - Toyoda, H.

AU - Sugai, H.

PY - 2007

Y1 - 2007

KW - Energiteknologier på vej

U2 - 10.1016/j.tsf.2006.10.099

DO - 10.1016/j.tsf.2006.10.099

M3 - Conference article

SN - 0040-6090

VL - 515

SP - 4887

EP - 4891

JO - Thin Solid Films

JF - Thin Solid Films

T2 - 3rd International Symposium on Dry Process - DPS 2005

Y2 - 28 November 2005 through 30 November 2005

ER -