Investigation of the ion dose non-uniformity caused by sheath-lens focusing effect on silicon wafers

N. Holtzer (Invited author), Eugen Stamate (Invited author), H. Toyoda (Invited author), H. Sugai (Invited author)

    Research output: Contribution to journalConference articleResearchpeer-review

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    Original languageEnglish
    JournalThin Solid Films
    Volume515
    Pages (from-to)4887-4891
    ISSN0040-6090
    DOIs
    Publication statusPublished - 2007
    Event3rd International Symposium on Dry Process - DPS 2005 - Jeju, Korea, Republic of
    Duration: 28 Nov 200530 Nov 2005

    Conference

    Conference3rd International Symposium on Dry Process - DPS 2005
    CountryKorea, Republic of
    CityJeju
    Period28/11/200530/11/2005

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