Investigation of Photolithography Process on SPOs for the ATHENA Mission

S. Massahi; D. A. Girou; D. D. M. Ferreira; F. E. Christensen; A. C. Jakobsen; B Shortt; M. Collon; B. Landgraf

doi:10.1117/12.2186810

Investigation of Photolithography Process on SPOs for the ATHENA Mission

S. Massahi, D. A. Girou, D. D. M. Ferreira, F. E. Christensen, A. C. Jakobsen, B Shortt, M. Collon, B. Landgraf

Research output: Chapter in Book/Report/Conference proceeding › Article in proceedings › Research › peer-review

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Abstract

As part of the ongoing effort to optimize the throughput of the Athena optics we have produced mirrors with a state-of-the-art cleaning process. We report on the studies related to the importance of the photolithographic process. Pre-coating characterization of the mirrors has shown and still shows photoresist remnants on the SiO2- rib bonding zones, which influences the quality of the metallic coating and ultimately the mirror performance. The size of the photoresist remnants is on the order of 10 nm which is about half the thickness of final metallic coating. An improved photoresist process has been developed including cleaning with O2 plasma in order to remove the remaining photoresist remnants prior to coating. Surface roughness results indicate that the SiO2-rib bonding zones are as clean as before the photolithography process is performed.

Original language	English
Title of host publication	Proceedings of SPIE
Volume	9603
Publisher	SPIE - International Society for Optical Engineering
Publication date	2015
Article number	96030M
DOIs	https://doi.org/10.1117/12.2186810
Publication status	Published - 2015
Event	Optics for EUV, X-Ray, and Gamma-Ray Astronomy VII: Conference 9603 - San Diego Convention Center, San Diego, United States Duration: 10 Aug 2015 → 13 Aug 2015 Conference number: 7

Conference

Conference	Optics for EUV, X-Ray, and Gamma-Ray Astronomy VII
Number	7
Location	San Diego Convention Center
Country/Territory	United States
City	San Diego
Period	10/08/2015 → 13/08/2015

Series	Proceedings of SPIE - The International Society for Optical Engineering
ISSN	0277-786X

Bibliographical note

Copyright 2015 Society of Photo Optical Instrumentation Engineers. One print or electronic copy may be made for personal use only. Systematic electronic or print reproduction and distribution, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper are prohibited.

Keywords

Athena
Silicon Pore Optics (SPO)
AFM
SEM
Photoresist
Surface Roughness
Photolithography Process
O2 Plasma
Stacking

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title = "Investigation of Photolithography Process on SPOs for the ATHENA Mission",

abstract = "As part of the ongoing effort to optimize the throughput of the Athena optics we have produced mirrors with a state-of-the-art cleaning process. We report on the studies related to the importance of the photolithographic process. Pre-coating characterization of the mirrors has shown and still shows photoresist remnants on the SiO2- rib bonding zones, which influences the quality of the metallic coating and ultimately the mirror performance. The size of the photoresist remnants is on the order of 10 nm which is about half the thickness of final metallic coating. An improved photoresist process has been developed including cleaning with O2 plasma in order to remove the remaining photoresist remnants prior to coating. Surface roughness results indicate that the SiO2-rib bonding zones are as clean as before the photolithography process is performed.",

keywords = "Athena, Silicon Pore Optics (SPO), AFM, SEM, Photoresist, Surface Roughness, Photolithography Process, O2 Plasma, Stacking",

author = "S. Massahi and Girou, {D. A.} and Ferreira, {D. D. M.} and Christensen, {F. E.} and Jakobsen, {A. C.} and B Shortt and M. Collon and B. Landgraf",

note = "Copyright 2015 Society of Photo Optical Instrumentation Engineers. One print or electronic copy may be made for personal use only. Systematic electronic or print reproduction and distribution, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper are prohibited.; Optics for EUV, X-Ray, and Gamma-Ray Astronomy VII : Conference 9603 ; Conference date: 10-08-2015 Through 13-08-2015",

year = "2015",

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Massahi, S, Girou, DA, Ferreira, DDM , Christensen, FE, Jakobsen, AC, Shortt, B, Collon, M & Landgraf, B 2015, Investigation of Photolithography Process on SPOs for the ATHENA Mission. in Proceedings of SPIE. vol. 9603, 96030M , SPIE - International Society for Optical Engineering, Proceedings of SPIE - The International Society for Optical Engineering, Optics for EUV, X-Ray, and Gamma-Ray Astronomy VII, San Diego, California, United States, 10/08/2015. https://doi.org/10.1117/12.2186810

Investigation of Photolithography Process on SPOs for the ATHENA Mission. / Massahi, S.; Girou, D. A.; Ferreira, D. D. M. et al.
Proceedings of SPIE. Vol. 9603 SPIE - International Society for Optical Engineering, 2015. 96030M (Proceedings of SPIE - The International Society for Optical Engineering).

Research output: Chapter in Book/Report/Conference proceeding › Article in proceedings › Research › peer-review

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AU - Girou, D. A.

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AU - Jakobsen, A. C.

AU - Shortt, B

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AB - As part of the ongoing effort to optimize the throughput of the Athena optics we have produced mirrors with a state-of-the-art cleaning process. We report on the studies related to the importance of the photolithographic process. Pre-coating characterization of the mirrors has shown and still shows photoresist remnants on the SiO2- rib bonding zones, which influences the quality of the metallic coating and ultimately the mirror performance. The size of the photoresist remnants is on the order of 10 nm which is about half the thickness of final metallic coating. An improved photoresist process has been developed including cleaning with O2 plasma in order to remove the remaining photoresist remnants prior to coating. Surface roughness results indicate that the SiO2-rib bonding zones are as clean as before the photolithography process is performed.

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KW - SEM

KW - Photoresist

KW - Surface Roughness

KW - Photolithography Process

KW - O2 Plasma

KW - Stacking

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M3 - Article in proceedings

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ER -

Investigation of Photolithography Process on SPOs for the ATHENA Mission

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Bibliographical note

Keywords

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