Integrating nanotubes into microsystems with electron beam lithography and in situ catalytically activated growth

Kjetil Gjerde, Marc Fornés-Mora, Jakob Kjelstrup-Hansen, T. Schurmann, Lauge Gammelgaard, M. Aono, K.B.K Teo, W.I. Milne, Peter Bøggild

    Research output: Contribution to journalJournal articleResearchpeer-review

    Abstract

    Integration of freestanding wire-like structures such as multi walled carbon nanotubes (MWCNT) into microsystems has many potential applications. Devices such as AFM tips or improved electrodes for conductivity measurements are obvious candidates. Catalytically activated growth opens up the possibility of waferscale fabrication of such devices. We combine conventional microfabrication techniques with state of the art electron beam lithography (EBL) to precisely position catalyst nanoparticles with sub 100 nm diameter into the microsystems. In particular, we have explored two main approaches which allow the catalyst material deposition to occur after the microfabrication is finished, thus avoiding contamination of cleanroom equipment. (c) 2006 WILEY-VCH Verlag GmbH & Co. KG&A, Weinheim.
    Original languageEnglish
    JournalPHYSICA STATUS SOLIDI A-APPLIED RESEARCH
    Volume203
    Issue number6
    Pages (from-to)1094-1099
    ISSN0031-8965
    DOIs
    Publication statusPublished - 2006

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