Installation and commissioning of the silicon pore optics coating facility for the ATHENA mission

S. Massahi, F. E. Christensen, D. D. MDella Monica F Ferreira, A. Jafari, S. Svendsen, P. L. Henriksen, B. Shortt, I. Ferreira, M. Bavdaz, M. Collon, B. Landgraf, D.A. Girou, A. Langer, W. Schönberger, T. Wellner, M. Krumrey, L. Cibik

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    Abstract

    We present the latest progress on the industrial scale coating facility for the Advanced Telescope for High-ENergy Astrophysics (ATHENA) mission. The facility has been successfully commissioned and tested, completing an important milestone in preparation of the Silicon Pore Optics (SPO) production capability. We qualified the coating facility by depositing iridium and boron carbide thin films in different configurations under various process conditions including pre-coating in-system plasma cleaning. The thin films were characterized with X-Ray Reectometry (XRR) using laboratory X-ray sources Cu K-α at 8.048 keV and PTB's four-crystal monochromator beamline at the synchrotron radiation facility BESSY II in the energy range from 3.6 keV to 10.0 keV. Additional X-ray Photoelectron Spectroscopy (XPS) measurements were performed with Al K-α radiation to analyze the composition of the deposited thin films.
    Original languageEnglish
    Title of host publicationProceedings of SPIE 11119, Optics for EUV, X-Ray, and Gamma-Ray Astronomy IX
    EditorsStephen L. O'Dell, Giovanni Pareschi
    Number of pages16
    Volume11119
    PublisherSPIE - International Society for Optical Engineering
    Publication date2019
    Article number111190F
    DOIs
    Publication statusPublished - 2019
    EventSPIE Optical Engineering + Applications 2019 - San Diego, United States
    Duration: 11 Aug 201915 Aug 2019

    Conference

    ConferenceSPIE Optical Engineering + Applications 2019
    Country/TerritoryUnited States
    CitySan Diego
    Period11/08/201915/08/2019
    SeriesProceedings of SPIE - The International Society for Optical Engineering
    ISSN0277-786X

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