Installation and commissioning of the silicon pore optics coating facility for the ATHENA mission

S. Massahi, F. E. Christensen, D. D. MDella Monica F Ferreira, A. Jafari, S. Svendsen, P. L. Henriksen, B. Shortt, I. Ferreira, M. Bavdaz, M. Collon, B. Landgraf, D.A. Girou, A. Langer, W. Schönberger, T. Wellner, M. Krumrey, L. Cibik

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Abstract

We present the latest progress on the industrial scale coating facility for the Advanced Telescope for High-ENergy Astrophysics (ATHENA) mission. The facility has been successfully commissioned and tested, completing an important milestone in preparation of the Silicon Pore Optics (SPO) production capability. We qualified the coating facility by depositing iridium and boron carbide thin films in different configurations under various process conditions including pre-coating in-system plasma cleaning. The thin films were characterized with X-Ray Reectometry (XRR) using laboratory X-ray sources Cu K-α at 8.048 keV and PTB's four-crystal monochromator beamline at the synchrotron radiation facility BESSY II in the energy range from 3.6 keV to 10.0 keV. Additional X-ray Photoelectron Spectroscopy (XPS) measurements were performed with Al K-α radiation to analyze the composition of the deposited thin films.
Original languageEnglish
Title of host publicationProceedings of SPIE 11119, Optics for EUV, X-Ray, and Gamma-Ray Astronomy IX
EditorsStephen L. O'Dell, Giovanni Pareschi
Number of pages16
Volume11119
PublisherSPIE - International Society for Optical Engineering
Publication date2019
Article number111190F
DOIs
Publication statusPublished - 2019
Event2019 SPIE Optical Engineering + Applications - San Diego, United States
Duration: 11 Aug 201915 Aug 2019

Conference

Conference2019 SPIE Optical Engineering + Applications
Country/TerritoryUnited States
CitySan Diego
Period11/08/201915/08/2019
SeriesProceedings of SPIE, the International Society for Optical Engineering
Volume11119
ISSN0277-786X

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