Injection moulding antireflective nanostructures

Alexander Bruun Christiansen, Jeppe Sandvik Clausen, N. Asger Mortensen, Anders Kristensen

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Abstract

We present a method for injection moulding antireflective nanostructures on large areas, for high volume production. Nanostructured black silicon masters were fabricated by mask-less reactive ion etching, and electroplated with nickel. The nickel shim was antistiction coated and used in an injection moulding process, to fabricate the antireflective surfaces. The cycle-time was 35 s. The injection moulded structures had a height of 125 nm, and the visible spectrum reflectance of injection moulded black polypropylene surfaces was reduced from 4.5±0.5% to 2.5±0.5%. The gradient of the refractive index of the nanostructured surfaces was estimated from atomic force micrographs and the theoretical reflectance was calculated using the transfer matrix method and effective medium theory. The measured reflectance shows good agreement with the theory of graded index antireflective nanostructures. © 2014 Elsevier B.V. All rights reserved.
Original languageEnglish
Publication date2013
Number of pages4
Publication statusPublished - 2013
Event39th International Conference on Micro and Nano Engineering - London, United Kingdom
Duration: 16 Sep 201319 Sep 2013
Conference number: 39th

Conference

Conference39th International Conference on Micro and Nano Engineering
Number39th
Country/TerritoryUnited Kingdom
CityLondon
Period16/09/201319/09/2013

Keywords

  • Antireflection
  • Black silicon
  • Injection moulding
  • Large area
  • Large volume production
  • Nanofabrication
  • Nanostructures
  • Nanotechnology
  • Nickel
  • Polypropylenes
  • Reflection
  • Silicon
  • Transfer matrix method
  • Anti-reflection
  • Antireflective nanostructure
  • Atomic force micrographs
  • Effective medium theories
  • Gradient of the refractive index
  • Large volumes
  • Injection molding

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