Abstract
The surrounding sheath focuses the charged particles to distinct parts of the probe surface resulting in nonuniform physical and/or chemical properties. Then, after a time interval dependent of the
degree of plasma contamination, this process results in well-defined regions with different work functions that shape the probe characteristic leading to erroneous measurement of plasma temperature and ion density. For Ar/O2 and Ar/SF6 plasmas produced within a multipolar magnetically confined device we investigated bombardment by positive or negative charges and indirect heating to modify the surface of a planar probe. © 2002 American Vacuum Society.
degree of plasma contamination, this process results in well-defined regions with different work functions that shape the probe characteristic leading to erroneous measurement of plasma temperature and ion density. For Ar/O2 and Ar/SF6 plasmas produced within a multipolar magnetically confined device we investigated bombardment by positive or negative charges and indirect heating to modify the surface of a planar probe. © 2002 American Vacuum Society.
| Original language | English |
|---|---|
| Journal | Journal of Vacuum Science & Technology. A: International Journal Devoted to Vacuum, Surfaces, and Films |
| Volume | 20 |
| Pages (from-to) | 661-666 |
| ISSN | 1553-1813 |
| DOIs | |
| Publication status | Published - 2002 |
| Externally published | Yes |