Infinite Etching Selectivity with Conventional Photoresist in a Bosch Process

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    Original languageEnglish
    Publication date2017
    Publication statusPublished - 2017
    Event43rd International conference on Micro and Nano Engineering - Braga, Portugal
    Duration: 18 Sep 201722 Sep 2017
    Conference number: 43

    Conference

    Conference43rd International conference on Micro and Nano Engineering
    Number43
    CountryPortugal
    CityBraga
    Period18/09/201722/09/2017

    Keywords

    • Silicon plasma etching
    • Infinite selectivity
    • Bosch sequence

    Cite this

    Chang, B., Leussink, P., Jensen, F., Hübner, J., & Jansen, H. (2017). Infinite Etching Selectivity with Conventional Photoresist in a Bosch Process. Abstract from 43rd International conference on Micro and Nano Engineering, Braga, Portugal.