Increase of the photosensitivity of undoped poly(methylmethacrylate) under UV radiation at 325 nm

D. Sáez-Rodríguez, Kristian Nielsen, Ole Bang, D. J. Webb

Research output: Chapter in Book/Report/Conference proceedingArticle in proceedingsResearchpeer-review

Abstract

In this paper we report, for the first time to our knowledge, an increase of the photosensitivity of a microstructured polymer optical fibre (mPOF) made of undoped PMMA due to applied strain during the fabrication of the gratings. In the work, fibre Bragg gratings (FBGs) have been fabricated in undoped PMMA mPOFs with a hexagonal structure of three rings in the inner cladding. Two sets of FBGs were inscribed at two different resonant wavelengths (827 nm and 1562 nm) at different strains using an UV He-Cd laser at 325 nm focused by a lens and scanned over the fibre. We observed an increase of the reflection of the fibre Bragg gratings when the fabrication strain is higher. The photosensitivity mechanism is discussed in the paper along with the chemical reactions that could underlie the mechanism. Furthermore, the resolution limit of the material was investigated.
Original languageEnglish
Title of host publicationProceedings of SPIE
Volume9128
PublisherSPIE - International Society for Optical Engineering
Publication date2014
Article number91280P
DOIs
Publication statusPublished - 2014
EventMicro-structured and Specialty Optical Fibres III - Clarion Congress Hotel, Brussels, Belgium
Duration: 15 Apr 201418 Apr 2014

Conference

ConferenceMicro-structured and Specialty Optical Fibres III
LocationClarion Congress Hotel
Country/TerritoryBelgium
CityBrussels
Period15/04/201418/04/2014
SeriesProgress in Biomedical Optics and Imaging
ISSN1605-7422

Fingerprint

Dive into the research topics of 'Increase of the photosensitivity of undoped poly(methylmethacrylate) under UV radiation at 325 nm'. Together they form a unique fingerprint.

Cite this