Improvement of Dose Uniformity in Plasma Ion Implantation by Introducing a Vertical Biased Ring

Eugen Stamate, N. Holtzer, H. Sugai

Research output: Contribution to conferenceConference abstract for conferenceResearchpeer-review

Original languageEnglish
Publication date2004
Publication statusPublished - 2004
Externally publishedYes
Event7th Asia-Pacific Conference on Plasma Science and Technology - Fukuoka International Congress Center, Fukuoka, Japan
Duration: 29 Jun 20044 Jul 2004

Conference

Conference7th Asia-Pacific Conference on Plasma Science and Technology
LocationFukuoka International Congress Center
CountryJapan
CityFukuoka
Period29/06/200404/07/2004

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