Imprinted silicon-based nanophotonics

Peter Ingo Borel, Brian Bilenberg Olsen, Lars Hagedorn Frandsen, Theodor Nielsen, Jacob Fage-Pedersen, Andrei Lavrinenko, Jakob Søndergaard Jensen, Ole Sigmund, Anders Kristensen

Research output: Contribution to journalJournal articleResearchpeer-review


We demonstrate and optically characterize silicon-on-insulator based nanophotonic devices fabricated by nanoimprint lithography. In our demonstration, we have realized ordinary and topology-optimized photonic crystal waveguide structures. The topology-optimized structures require lateral pattern definition on a sub 30-nm scale in combination with a deep vertical silicon etch of the order of ~300 nm. The nanoimprint method offers a cost-efficient parallel fabrication process with state-of-the-art replication fidelity, comparable to direct electron beam writing.
Original languageEnglish
JournalOptics Express
Issue number3
Pages (from-to)1261-1266
Publication statusPublished - 2007


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