Ice Lithography for Nanodevices

Anpan Han; A. Kuan; J. Wang; D. Vlassarev; J. Golovchenko; D. Branton; William Tiddi; Marco Beleggia

Ice Lithography for Nanodevices

Anpan Han
, A. Kuan
, J. Wang
, D. Vlassarev
, J. Golovchenko
, D. Branton
, William Tiddi
, Marco Beleggia

Harvard University
Stanford University

Research output: Contribution to conference › Conference abstract for conference › Research › peer-review

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Abstract

Water vapor is condensed onto a cold sample, coating it with a thin-film of ice. The ice is sensitive to electron beam lithography exposure. 10 nm ice patterns are transferred into metals by “melt-off”. Non-planar samples are coated with ice, and we pattern on cantilevers, AFM tips, and suspended nanotubes.

Original language	English
Publication date	2015
Number of pages	2
Publication status	Published - 2015
Event	5th Conference on Advances in Optoelectronics and Micro/Nano-optics - Hangzhou, China Duration: 29 Oct 2015 → 31 Oct 2015 Conference number: 5

Conference

Conference	5th Conference on Advances in Optoelectronics and Micro/Nano-optics
Number	5
Country/Territory	China
City	Hangzhou
Period	29/10/2015 → 31/10/2015

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AOM 2015 Abstract Anpan Han 1Final published version, 1.02 MB

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@conference{27aa24d76a5542c9a06f2fbb52156ca2,

title = "Ice Lithography for Nanodevices",

abstract = "Water vapor is condensed onto a cold sample, coating it with a thin-film of ice. The ice is sensitive to electron beam lithography exposure. 10 nm ice patterns are transferred into metals by {\textquotedblleft}melt-off{\textquotedblright}. Non-planar samples are coated with ice, and we pattern on cantilevers, AFM tips, and suspended nanotubes.",

author = "Anpan Han and A. Kuan and J. Wang and D. Vlassarev and J. Golovchenko and D. Branton and William Tiddi and Marco Beleggia",

year = "2015",

language = "English",

note = "5th Conference on Advances in Optoelectronics and Micro/Nano-optics, AOM 2015 ; Conference date: 29-10-2015 Through 31-10-2015",

}

TY - ABST

T1 - Ice Lithography for Nanodevices

AU - Han, Anpan

AU - Kuan, A.

AU - Wang, J.

AU - Vlassarev, D.

AU - Golovchenko, J.

AU - Branton, D.

AU - Tiddi, William

AU - Beleggia, Marco

N1 - Conference code: 5

PY - 2015

Y1 - 2015

N2 - Water vapor is condensed onto a cold sample, coating it with a thin-film of ice. The ice is sensitive to electron beam lithography exposure. 10 nm ice patterns are transferred into metals by “melt-off”. Non-planar samples are coated with ice, and we pattern on cantilevers, AFM tips, and suspended nanotubes.

AB - Water vapor is condensed onto a cold sample, coating it with a thin-film of ice. The ice is sensitive to electron beam lithography exposure. 10 nm ice patterns are transferred into metals by “melt-off”. Non-planar samples are coated with ice, and we pattern on cantilevers, AFM tips, and suspended nanotubes.

M3 - Conference abstract for conference

T2 - 5th Conference on Advances in Optoelectronics and Micro/Nano-optics

Y2 - 29 October 2015 through 31 October 2015

ER -

Ice Lithography for Nanodevices

Abstract

Conference

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