Ice Lithography for Nanodevices

Anpan Han, Dimitar Vlassarev, Jenny Wang, Jene A. Golovchenko, Daniel Branton

Research output: Contribution to journalJournal articleResearchpeer-review

Abstract

We report the successful application of a new approach, ice lithography (IL), to fabricate nanoscale devices. The entire IL process takes place inside a modified scanning electron microscope (SEM), where a vapor-deposited film of water ice serves as a resist for e-beam lithography, greatly simplifying and streamlining device fabrication. We show, that labile. nanostructures such as carbon nanotubes can be safely imaged in an SEM when coated in ice. The ice film is patterned at high e-beam intensity and serves as a mask for lift-off without the device degradation and contamination associated with e-beam imaging and polymer resist residues. We demonstrate the IL preparation of carbon nanotube field effect transistors with high-quality trans-conductance properties.
Original languageEnglish
JournalNano letters
Volume10
Issue number12
Pages (from-to)5056-5059
Number of pages4
ISSN1530-6984
DOIs
Publication statusPublished - 2010
Externally publishedYes

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