Ice Lithography for Nanodevices

Anpan Han, A. Kuan, J. Wang, D. Vlassarev, J. Golovchenko, D. Branton, William Tiddi, Marco Beleggia

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    Abstract

    Water vapor is condensed onto a cold sample, coating it with a thin-film of ice. The ice is sensitive to electron beam lithography exposure. 10 nm ice patterns are transferred into metals by “melt-off”. Non-planar samples are coated with ice, and we pattern on cantilevers, AFM tips, and suspended nanotubes.
    Original languageEnglish
    Publication date2015
    Number of pages2
    Publication statusPublished - 2015
    Event5th Conference on Advances in Optoelectronics and Micro/Nano-optics - Hangzhou, China
    Duration: 29 Oct 201531 Oct 2015
    Conference number: 5

    Conference

    Conference5th Conference on Advances in Optoelectronics and Micro/Nano-optics
    Number5
    CountryChina
    CityHangzhou
    Period29/10/201531/10/2015

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