Hydrogen Treatment and FeOOH overlayer: Effective approaches for enhancing the photoelectrochemical water oxidation performance of bismuth vanadate thin films

Research output: Contribution to journalJournal article – Annual report year: 2019Researchpeer-review

  • Author: Singh, Aadesh P.

    Chalmers University of Technology, Sweden

  • Author: Saini, Nishant

    Indian Institute of Technology, Delhi, India

  • Author: Mehta, Bodh R.

    Indian Institute of Technology, Delhi, India

  • Author: Hellman, Anders

    Chalmers University of Technology, Sweden

  • Author: Iandolo, Beniamino

    Department of Health Technology, Technical University of Denmark, Denmark

  • Author: Wickman, Björn

    Chalmers University of Technology, Sweden

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The water oxidation capability of the promising photoanode bismuth vanadate (BiVO4) is hampered by poor bulk electron transport and by high rates of charge recombination at the semiconductor/electrolyte interface. Here, we demonstrate that a dual modification of BiVO4 by: (i) annealing in a hydrogen-containing environment and (ii) coating with FeOOH overlayer substantially enhances the water oxidation ability of BiVO4 photoanodes. Hydrogen treated, FeOOH coated BiVO4 photoanodes exhibit a water oxidation photocurrent density of 2.16 mA cm−2 at 1.23 VRHE, which is 5 times higher than for untreated BiVO4 films. Moreover, they showed an impressive low photocurrent onset potential of −0.11 VRHE. A stable photocurrent was observed for 1 h of water oxidation measurement at 1.23 VRHE under 1 Sun illumination. The enhanced photocurrent of FeOOH/H:BiVO4 photoanode is ascribed to an improved bulk charge transport, as confirmed by impedance spectroscopy measurements and Mott-Schottky analysis. The cathodic shift of the onset potential originates from a lowering of the flat band potential and from an improvement of the charge transport at the semiconductor/electrolyte interface. The dual modification strategy used here offers a simple but effective approach of improving the water oxidation performance of BiVO4.
Original languageEnglish
JournalCatalysis Today
Volume321-322
Pages (from-to)87-93
ISSN0920-5861
DOIs
Publication statusPublished - 2019
CitationsWeb of Science® Times Cited: No match on DOI

    Research areas

  • Bismuth vanadate, FeOOH, Hydrogen treatment, Photoelectrochemical, Solar hydrogen

ID: 145959403