Hydrogen Treatment and FeOOH overlayer: Effective approaches for enhancing the photoelectrochemical water oxidation performance of bismuth vanadate thin films

Aadesh P. Singh*, Nishant Saini, Bodh R. Mehta, Anders Hellman, Beniamino Iandolo, Björn Wickman

*Corresponding author for this work

Research output: Contribution to journalJournal articleResearchpeer-review

Abstract

The water oxidation capability of the promising photoanode bismuth vanadate (BiVO4) is hampered by poor bulk electron transport and by high rates of charge recombination at the semiconductor/electrolyte interface. Here, we demonstrate that a dual modification of BiVO4 by: (i) annealing in a hydrogen-containing environment and (ii) coating with FeOOH overlayer substantially enhances the water oxidation ability of BiVO4 photoanodes. Hydrogen treated, FeOOH coated BiVO4 photoanodes exhibit a water oxidation photocurrent density of 2.16 mA cm−2 at 1.23 VRHE, which is 5 times higher than for untreated BiVO4 films. Moreover, they showed an impressive low photocurrent onset potential of −0.11 VRHE. A stable photocurrent was observed for 1 h of water oxidation measurement at 1.23 VRHE under 1 Sun illumination. The enhanced photocurrent of FeOOH/H:BiVO4 photoanode is ascribed to an improved bulk charge transport, as confirmed by impedance spectroscopy measurements and Mott-Schottky analysis. The cathodic shift of the onset potential originates from a lowering of the flat band potential and from an improvement of the charge transport at the semiconductor/electrolyte interface. The dual modification strategy used here offers a simple but effective approach of improving the water oxidation performance of BiVO4.
Original languageEnglish
JournalCatalysis Today
Volume321-322
Pages (from-to)87-93
ISSN0920-5861
DOIs
Publication statusPublished - 2019

Keywords

  • Bismuth vanadate
  • FeOOH
  • Hydrogen treatment
  • Photoelectrochemical
  • Solar hydrogen

Cite this

Singh, Aadesh P. ; Saini, Nishant ; Mehta, Bodh R. ; Hellman, Anders ; Iandolo, Beniamino ; Wickman, Björn. / Hydrogen Treatment and FeOOH overlayer: Effective approaches for enhancing the photoelectrochemical water oxidation performance of bismuth vanadate thin films. In: Catalysis Today. 2019 ; Vol. 321-322. pp. 87-93.
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abstract = "The water oxidation capability of the promising photoanode bismuth vanadate (BiVO4) is hampered by poor bulk electron transport and by high rates of charge recombination at the semiconductor/electrolyte interface. Here, we demonstrate that a dual modification of BiVO4 by: (i) annealing in a hydrogen-containing environment and (ii) coating with FeOOH overlayer substantially enhances the water oxidation ability of BiVO4 photoanodes. Hydrogen treated, FeOOH coated BiVO4 photoanodes exhibit a water oxidation photocurrent density of 2.16 mA cm−2 at 1.23 VRHE, which is 5 times higher than for untreated BiVO4 films. Moreover, they showed an impressive low photocurrent onset potential of −0.11 VRHE. A stable photocurrent was observed for 1 h of water oxidation measurement at 1.23 VRHE under 1 Sun illumination. The enhanced photocurrent of FeOOH/H:BiVO4 photoanode is ascribed to an improved bulk charge transport, as confirmed by impedance spectroscopy measurements and Mott-Schottky analysis. The cathodic shift of the onset potential originates from a lowering of the flat band potential and from an improvement of the charge transport at the semiconductor/electrolyte interface. The dual modification strategy used here offers a simple but effective approach of improving the water oxidation performance of BiVO4.",
keywords = "Bismuth vanadate, FeOOH, Hydrogen treatment, Photoelectrochemical, Solar hydrogen",
author = "Singh, {Aadesh P.} and Nishant Saini and Mehta, {Bodh R.} and Anders Hellman and Beniamino Iandolo and Bj{\"o}rn Wickman",
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Hydrogen Treatment and FeOOH overlayer: Effective approaches for enhancing the photoelectrochemical water oxidation performance of bismuth vanadate thin films. / Singh, Aadesh P. ; Saini, Nishant ; Mehta, Bodh R. ; Hellman, Anders; Iandolo, Beniamino; Wickman, Björn.

In: Catalysis Today, Vol. 321-322, 2019, p. 87-93.

Research output: Contribution to journalJournal articleResearchpeer-review

TY - JOUR

T1 - Hydrogen Treatment and FeOOH overlayer: Effective approaches for enhancing the photoelectrochemical water oxidation performance of bismuth vanadate thin films

AU - Singh, Aadesh P.

AU - Saini, Nishant

AU - Mehta, Bodh R.

AU - Hellman, Anders

AU - Iandolo, Beniamino

AU - Wickman, Björn

PY - 2019

Y1 - 2019

N2 - The water oxidation capability of the promising photoanode bismuth vanadate (BiVO4) is hampered by poor bulk electron transport and by high rates of charge recombination at the semiconductor/electrolyte interface. Here, we demonstrate that a dual modification of BiVO4 by: (i) annealing in a hydrogen-containing environment and (ii) coating with FeOOH overlayer substantially enhances the water oxidation ability of BiVO4 photoanodes. Hydrogen treated, FeOOH coated BiVO4 photoanodes exhibit a water oxidation photocurrent density of 2.16 mA cm−2 at 1.23 VRHE, which is 5 times higher than for untreated BiVO4 films. Moreover, they showed an impressive low photocurrent onset potential of −0.11 VRHE. A stable photocurrent was observed for 1 h of water oxidation measurement at 1.23 VRHE under 1 Sun illumination. The enhanced photocurrent of FeOOH/H:BiVO4 photoanode is ascribed to an improved bulk charge transport, as confirmed by impedance spectroscopy measurements and Mott-Schottky analysis. The cathodic shift of the onset potential originates from a lowering of the flat band potential and from an improvement of the charge transport at the semiconductor/electrolyte interface. The dual modification strategy used here offers a simple but effective approach of improving the water oxidation performance of BiVO4.

AB - The water oxidation capability of the promising photoanode bismuth vanadate (BiVO4) is hampered by poor bulk electron transport and by high rates of charge recombination at the semiconductor/electrolyte interface. Here, we demonstrate that a dual modification of BiVO4 by: (i) annealing in a hydrogen-containing environment and (ii) coating with FeOOH overlayer substantially enhances the water oxidation ability of BiVO4 photoanodes. Hydrogen treated, FeOOH coated BiVO4 photoanodes exhibit a water oxidation photocurrent density of 2.16 mA cm−2 at 1.23 VRHE, which is 5 times higher than for untreated BiVO4 films. Moreover, they showed an impressive low photocurrent onset potential of −0.11 VRHE. A stable photocurrent was observed for 1 h of water oxidation measurement at 1.23 VRHE under 1 Sun illumination. The enhanced photocurrent of FeOOH/H:BiVO4 photoanode is ascribed to an improved bulk charge transport, as confirmed by impedance spectroscopy measurements and Mott-Schottky analysis. The cathodic shift of the onset potential originates from a lowering of the flat band potential and from an improvement of the charge transport at the semiconductor/electrolyte interface. The dual modification strategy used here offers a simple but effective approach of improving the water oxidation performance of BiVO4.

KW - Bismuth vanadate

KW - FeOOH

KW - Hydrogen treatment

KW - Photoelectrochemical

KW - Solar hydrogen

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DO - 10.1016/j.cattod.2018.03.041

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JF - Catalysis Today

SN - 0920-5861

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