Highly oriented δ-Bi2O3 thin films stable at room temperature synthesized by reactive magnetron sputtering

P. Lunca Popa, S. Sønderby, S. Kerdsongpanya, J. Lu, Nikolaos Bonanos, P. Eklund

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Abstract

We report the synthesis by reactive magnetron sputtering and structural characterization of highly (111)-oriented thin films of δ–Bi2O3. This phase is obtained at a substrate temperature of 150–200 °C in a narrow window of O2/Ar ratio in the sputtering gas (18%–20%). Transmission electron microscopy and x-ray diffraction reveal a polycrystalline columnar structure with (111) texture. The films are stable from room temperature up to 250 °C in vacuum and 350 °C in ambient air. © 2013 American Institute of Physics

Original languageEnglish
Article number046101
JournalJournal of Applied Physics
Volume113
Number of pages3
ISSN0021-8979
DOIs
Publication statusPublished - 2013

Bibliographical note

Copyright (2013) American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. The following article appeared in J. Appl. Phys. 113, 046101 (2013) and may be found at http://jap.aip.org/resource/1/JAPIAU/v113/i4.

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