Highly Ordered 3D Silicon Micro-Mesh Structures Integrated with Nanowire Arrays: A Multifunctional Platform for Photodegradation, Photocurrent Generation, and Materials Conversion

Bingdong Chang*, Yingying Tang, mingli Liang, Henri Jansen, Flemming Jensen, Bo Wang, Kristian Mølhave, Jörg Hübner, Hongyu Sun

*Corresponding author for this work

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Abstract

Hierarchical three dimensional (3D) microstructures integrated with low‐dimensional nanomaterials can realize novel properties or improved performance. We report a unique conductive and highly ordered 3D silicon micro‐mesh structure, which is fabricated by standard lithography using a modified plasma etch process. Zinc oxide (ZnO) nanowires are then integrated with the micro‐mesh, and the density of ZnO nanowires (NWs) can be increased by around one order of magnitude compared with ZnO NWs on a 2D substrate. Owing to the high spatial density of ZnO NWs on the robust 3D silicon micro‐mesh structures, improved photocatalytic activity and stability can be achieved. A remarkable enhancement of photocurrent response is also observed. The ZnO can be converted into ZnS NWs and ZnO@ZIF‐8 as on the micromesh. This method is low‐cost and compatible with traditional complementary metal–oxide–semiconductor industries, and provides new possibilities for a wide range of devices based on micro‐nano‐electro‐mechanical and chemical systems.
Original languageEnglish
JournalChemNanoMat
Volume5
Issue number1
Pages (from-to)92-100
Number of pages10
ISSN2199-692X
DOIs
Publication statusPublished - 2019

Keywords

  • three dimensional structures
  • nanowire arrays
  • photocatalytic
  • photocurrent
  • materials conversion

Cite this

@article{a67887a7ee6047c3b1cd44d62b160fc4,
title = "Highly Ordered 3D Silicon Micro-Mesh Structures Integrated with Nanowire Arrays: A Multifunctional Platform for Photodegradation, Photocurrent Generation, and Materials Conversion",
abstract = "Hierarchical three dimensional (3D) microstructures integrated with low‐dimensional nanomaterials can realize novel properties or improved performance. We report a unique conductive and highly ordered 3D silicon micro‐mesh structure, which is fabricated by standard lithography using a modified plasma etch process. Zinc oxide (ZnO) nanowires are then integrated with the micro‐mesh, and the density of ZnO nanowires (NWs) can be increased by around one order of magnitude compared with ZnO NWs on a 2D substrate. Owing to the high spatial density of ZnO NWs on the robust 3D silicon micro‐mesh structures, improved photocatalytic activity and stability can be achieved. A remarkable enhancement of photocurrent response is also observed. The ZnO can be converted into ZnS NWs and ZnO@ZIF‐8 as on the micromesh. This method is low‐cost and compatible with traditional complementary metal–oxide–semiconductor industries, and provides new possibilities for a wide range of devices based on micro‐nano‐electro‐mechanical and chemical systems.",
keywords = "three dimensional structures, nanowire arrays, photocatalytic, photocurrent, materials conversion",
author = "Bingdong Chang and Yingying Tang and mingli Liang and Henri Jansen and Flemming Jensen and Bo Wang and Kristian M{\o}lhave and J{\"o}rg H{\"u}bner and Hongyu Sun",
year = "2019",
doi = "10.1002/cnma.201800371",
language = "English",
volume = "5",
pages = "92--100",
journal = "ChemNanoMat",
issn = "2199-692X",
publisher = "Wiley - V C H Verlag GmbH & Co. KGaA",
number = "1",

}

TY - JOUR

T1 - Highly Ordered 3D Silicon Micro-Mesh Structures Integrated with Nanowire Arrays: A Multifunctional Platform for Photodegradation, Photocurrent Generation, and Materials Conversion

AU - Chang, Bingdong

AU - Tang, Yingying

AU - Liang, mingli

AU - Jansen, Henri

AU - Jensen, Flemming

AU - Wang, Bo

AU - Mølhave, Kristian

AU - Hübner, Jörg

AU - Sun, Hongyu

PY - 2019

Y1 - 2019

N2 - Hierarchical three dimensional (3D) microstructures integrated with low‐dimensional nanomaterials can realize novel properties or improved performance. We report a unique conductive and highly ordered 3D silicon micro‐mesh structure, which is fabricated by standard lithography using a modified plasma etch process. Zinc oxide (ZnO) nanowires are then integrated with the micro‐mesh, and the density of ZnO nanowires (NWs) can be increased by around one order of magnitude compared with ZnO NWs on a 2D substrate. Owing to the high spatial density of ZnO NWs on the robust 3D silicon micro‐mesh structures, improved photocatalytic activity and stability can be achieved. A remarkable enhancement of photocurrent response is also observed. The ZnO can be converted into ZnS NWs and ZnO@ZIF‐8 as on the micromesh. This method is low‐cost and compatible with traditional complementary metal–oxide–semiconductor industries, and provides new possibilities for a wide range of devices based on micro‐nano‐electro‐mechanical and chemical systems.

AB - Hierarchical three dimensional (3D) microstructures integrated with low‐dimensional nanomaterials can realize novel properties or improved performance. We report a unique conductive and highly ordered 3D silicon micro‐mesh structure, which is fabricated by standard lithography using a modified plasma etch process. Zinc oxide (ZnO) nanowires are then integrated with the micro‐mesh, and the density of ZnO nanowires (NWs) can be increased by around one order of magnitude compared with ZnO NWs on a 2D substrate. Owing to the high spatial density of ZnO NWs on the robust 3D silicon micro‐mesh structures, improved photocatalytic activity and stability can be achieved. A remarkable enhancement of photocurrent response is also observed. The ZnO can be converted into ZnS NWs and ZnO@ZIF‐8 as on the micromesh. This method is low‐cost and compatible with traditional complementary metal–oxide–semiconductor industries, and provides new possibilities for a wide range of devices based on micro‐nano‐electro‐mechanical and chemical systems.

KW - three dimensional structures

KW - nanowire arrays

KW - photocatalytic

KW - photocurrent

KW - materials conversion

U2 - 10.1002/cnma.201800371

DO - 10.1002/cnma.201800371

M3 - Journal article

VL - 5

SP - 92

EP - 100

JO - ChemNanoMat

JF - ChemNanoMat

SN - 2199-692X

IS - 1

ER -