High-efficiency, large-bandwidth silicon-on-insulator grating coupler based on a fully-etched photonic crystal structure

Research output: Contribution to journalJournal article – Annual report year: 2010Researchpeer-review

View graph of relations

A grating coupler for interfacing between single-mode fibers and photonic circuits on silicon-on-insulator is demonstrated. It consists of columns of fully etched photonic crystal holes, which are made in the same lithography and etching processes used for making the silicon-on-insulator wire waveguide. The holes have a diameter of around 143 nm, and are defined with electron-beam lithography. A peak coupling efficiency of 42% at 1550 nm and 1 dB bandwidth of 37 nm, as well as a low back reflection, are achieved. The performance of the proposed fully etched grating coupler is comparable to that based on the conventional shallowly etched grating, which needs additional fabrication steps.
Original languageEnglish
JournalApplied Physics Letters
Issue number5
Pages (from-to)051126
Publication statusPublished - 2010

Bibliographical note

Copyright (2010) American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics.

CitationsWeb of Science® Times Cited: No match on DOI
Download as:
Download as PDF
Select render style:
Download as HTML
Select render style:
Download as Word
Select render style:

Download statistics

No data available

ID: 4865199