High-temperature stability of thermoelectric Ca3Co4O9 thin films

P. Brinks, Ngo Van Nong, Nini Pryds, Guus Rijnders, M. Huijben

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Abstract

An enhanced thermal stability in thermoelectric Ca3Co4O9 thin films up to 550 °C in an oxygen rich environment was demonstrated by high-temperature electrical and X-ray diffraction measurements. In contrast to generally performed heating in helium gas, it is shown that an oxygen/helium mixture provides sufficient thermal contact, while preventing the previously disregarded formation of oxygen vacancies. Combining thermal cycling with electrical measurements proves to be a powerful tool to study the real intrinsic thermoelectric behaviour of oxide thin films at elevated temperatures. © 2015 AIP Publishing LLC.
Original languageEnglish
Article number143903
JournalApplied Physics Letters
Volume106
Number of pages4
ISSN0003-6951
DOIs
Publication statusPublished - 2015

Bibliographical note

Copyright 2015, American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. The following article appeared in (Applied Physics Letters 106 (2015) 143903) and may be found at http://scitation.aip.org/content/aip/journal/apl/106/14/10.1063/1.4917275

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