High pattern density nanoimprint lithography stamps fabricated by means of negative electron beam lithography resist, TEBN-1, and dry etching in silicon

Brian Bilenberg Olsen; Mikkel Schøler; Michael Stenbæk Schmidt; Peixiong Shi; Peter Bøggild; Lars Hagedorn Frandsen; Peter Ingo Borel; Anders Kristensen

High pattern density nanoimprint lithography stamps fabricated by means of negative electron beam lithography resist, TEBN-1, and dry etching in silicon

Brian Bilenberg Olsen
, Mikkel Schøler
, Michael Stenbæk Schmidt
, Peixiong Shi
, Peter Bøggild
, Lars Hagedorn Frandsen
, Peter Ingo Borel
, Anders Kristensen

Research output: Contribution to conference › Poster › Research › peer-review

Original language	English
Publication date	2005
Publication status	Published - 2005
Event	The 4th International Conference on Nanoimprint and Nanoprint - Nara, Japan Duration: 19 Oct 2005 → 21 Oct 2005 Conference number: 4

Conference

Conference	The 4th International Conference on Nanoimprint and Nanoprint
Number	4
Country/Territory	Japan
City	Nara
Period	19/10/2005 → 21/10/2005

OpenUrl availability

Check availability in DTU Findit

Cite this

Olsen, B. B., Schøler, M., Schmidt, M. S., Shi, P., Bøggild, P., Frandsen, L. H., Borel, P. I., & Kristensen, A. (2005). High pattern density nanoimprint lithography stamps fabricated by means of negative electron beam lithography resist, TEBN-1, and dry etching in silicon. Poster session presented at The 4th International Conference on Nanoimprint and Nanoprint, Nara, Japan.

@conference{5b3f5a3e89f741a1a36f318f47b94ead,

title = "High pattern density nanoimprint lithography stamps fabricated by means of negative electron beam lithography resist, TEBN-1, and dry etching in silicon",

author = "Olsen, \{Brian Bilenberg\} and Mikkel Sch{\o}ler and Schmidt, \{Michael Stenb{\ae}k\} and Peixiong Shi and Peter B{\o}ggild and Frandsen, \{Lars Hagedorn\} and Borel, \{Peter Ingo\} and Anders Kristensen",

year = "2005",

language = "English",

note = "The 4th International Conference on Nanoimprint and Nanoprint, NNT'05 ; Conference date: 19-10-2005 Through 21-10-2005",

}

High pattern density nanoimprint lithography stamps fabricated by means of negative electron beam lithography resist, TEBN-1, and dry etching in silicon. / Olsen, Brian Bilenberg; Schøler, Mikkel; Schmidt, Michael Stenbæk et al.
2005. Poster session presented at The 4th International Conference on Nanoimprint and Nanoprint, Nara, Japan.

Research output: Contribution to conference › Poster › Research › peer-review

TY - CONF

T1 - High pattern density nanoimprint lithography stamps fabricated by means of negative electron beam lithography resist, TEBN-1, and dry etching in silicon

AU - Olsen, Brian Bilenberg

AU - Schøler, Mikkel

AU - Schmidt, Michael Stenbæk

AU - Shi, Peixiong

AU - Bøggild, Peter

AU - Frandsen, Lars Hagedorn

AU - Borel, Peter Ingo

AU - Kristensen, Anders

N1 - Conference code: 4

PY - 2005

Y1 - 2005

M3 - Poster

T2 - The 4th International Conference on Nanoimprint and Nanoprint

Y2 - 19 October 2005 through 21 October 2005

ER -