High pattern density nanoimprint lithography stamps fabricated by means of negative electron beam lithography resist, TEBN-1, and dry etching in silicon

Brian Bilenberg Olsen, Mikkel Schøler, M. Stenbæk Schmidt, P. Shi, Peter Bøggild, L.H. Frandsen, P.I. Borel, Anders Kristensen

    Research output: Chapter in Book/Report/Conference proceedingArticle in proceedingsResearchpeer-review

    Original languageEnglish
    Title of host publicationProceedings of the 4th Internternational Conference on Nanoimprint and Nanoprint, NNT'05
    Publication date2006
    Publication statusPublished - 2006
    EventThe 4th Internternational Conference on Nanoimprint and Nanoprint, NNT'05, 19 - 21 October - Nare, Japan
    Duration: 1 Jan 2006 → …

    Conference

    ConferenceThe 4th Internternational Conference on Nanoimprint and Nanoprint, NNT'05, 19 - 21 October
    CityNare, Japan
    Period01/01/2006 → …

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