High pattern density nanoimprint lithography stamps fabricated by means of negative electron beam lithography resist, TEBN-1, and dry etching in silicon

Brian Bilenberg Olsen; Mikkel Schøler; M. Stenbæk Schmidt; P. Shi; Peter Bøggild; L.H. Frandsen; P.I. Borel; Anders Kristensen

High pattern density nanoimprint lithography stamps fabricated by means of negative electron beam lithography resist, TEBN-1, and dry etching in silicon

Brian Bilenberg Olsen, Mikkel Schøler, M. Stenbæk Schmidt, P. Shi, Peter Bøggild, L.H. Frandsen, P.I. Borel, Anders Kristensen

Research output: Chapter in Book/Report/Conference proceeding › Article in proceedings › Research › peer-review

Original language	English
Title of host publication	Proceedings of the 4th Internternational Conference on Nanoimprint and Nanoprint, NNT'05
Publication date	2006
Publication status	Published - 2006
Event	The 4th International Conference on Nanoimprint and Nanoprint - Nara, Japan Duration: 19 Oct 2005 → 21 Oct 2005 Conference number: 4

Conference

Conference	The 4th International Conference on Nanoimprint and Nanoprint
Number	4
Country/Territory	Japan
City	Nara
Period	19/10/2005 → 21/10/2005

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@inproceedings{ce196f7916f04203a05906f4e3cf0ecf,

title = "High pattern density nanoimprint lithography stamps fabricated by means of negative electron beam lithography resist, TEBN-1, and dry etching in silicon",

author = "Olsen, {Brian Bilenberg} and Mikkel Sch{\o}ler and Schmidt, {M. Stenb{\ae}k} and P. Shi and Peter B{\o}ggild and L.H. Frandsen and P.I. Borel and Anders Kristensen",

year = "2006",

language = "English",

booktitle = "Proceedings of the 4th Internternational Conference on Nanoimprint and Nanoprint, NNT'05",

note = "The 4th International Conference on Nanoimprint and Nanoprint, NNT'05 ; Conference date: 19-10-2005 Through 21-10-2005",

}

Olsen, BB, Schøler, M, Schmidt, MS, Shi, P, Bøggild, P, Frandsen, LH, Borel, PI & Kristensen, A 2006, High pattern density nanoimprint lithography stamps fabricated by means of negative electron beam lithography resist, TEBN-1, and dry etching in silicon. in Proceedings of the 4th Internternational Conference on Nanoimprint and Nanoprint, NNT'05. The 4th International Conference on Nanoimprint and Nanoprint, Nara, Japan, 19/10/2005.

High pattern density nanoimprint lithography stamps fabricated by means of negative electron beam lithography resist, TEBN-1, and dry etching in silicon. / Olsen, Brian Bilenberg; Schøler, Mikkel; Schmidt, M. Stenbæk et al.
Proceedings of the 4th Internternational Conference on Nanoimprint and Nanoprint, NNT'05. 2006.

Research output: Chapter in Book/Report/Conference proceeding › Article in proceedings › Research › peer-review

TY - GEN

T1 - High pattern density nanoimprint lithography stamps fabricated by means of negative electron beam lithography resist, TEBN-1, and dry etching in silicon

AU - Olsen, Brian Bilenberg

AU - Schøler, Mikkel

AU - Schmidt, M. Stenbæk

AU - Shi, P.

AU - Bøggild, Peter

AU - Frandsen, L.H.

AU - Borel, P.I.

AU - Kristensen, Anders

N1 - Conference code: 4

PY - 2006

Y1 - 2006

M3 - Article in proceedings

BT - Proceedings of the 4th Internternational Conference on Nanoimprint and Nanoprint, NNT'05

T2 - The 4th International Conference on Nanoimprint and Nanoprint

Y2 - 19 October 2005 through 21 October 2005

ER -