High Pattern Density Nanoimprint Lithography Stamps Fabricated by Means of Negative Electron Beam Lithography Resist and dry Etching in Silicon

Brian Bilenberg Olsen, Mikkel Schøler, Michael Stenbæk Schmidt, Peter Bøggild, Anders Kristensen, P. Shi, L. Hagedorn Frandsen, P. I. Borel

    Research output: Contribution to conferencePosterResearch

    Original languageEnglish
    Publication date2005
    Publication statusPublished - 2005
    EventDanish Optical Society Annual Meeting -
    Duration: 1 Jan 2005 → …

    Conference

    ConferenceDanish Optical Society Annual Meeting
    Period01/01/2005 → …

    Cite this

    Olsen, B. B., Schøler, M., Schmidt, M. S., Bøggild, P., Kristensen, A., Shi, P., Hagedorn Frandsen, L., & Borel, P. I. (2005). High Pattern Density Nanoimprint Lithography Stamps Fabricated by Means of Negative Electron Beam Lithography Resist and dry Etching in Silicon. Poster session presented at Danish Optical Society Annual Meeting, .