High Pattern Density Nanoimprint Lithography Stamps Fabricated by Means of Negative Electron Beam Lithography Resist and dry Etching in Silicon

Brian Bilenberg Olsen; Mikkel Schøler; Michael Stenbæk Schmidt; Peter Bøggild; Anders Kristensen; P. Shi; L. Hagedorn Frandsen; P. I. Borel

High Pattern Density Nanoimprint Lithography Stamps Fabricated by Means of Negative Electron Beam Lithography Resist and dry Etching in Silicon

Brian Bilenberg Olsen, Mikkel Schøler, Michael Stenbæk Schmidt, Peter Bøggild, Anders Kristensen, P. Shi, L. Hagedorn Frandsen, P. I. Borel

Research output: Contribution to conference › Poster › Research

Original language	English
Publication date	2005
Publication status	Published - 2005
Event	Danish Optical Society Annual Meeting - Duration: 1 Jan 2005 → …

Conference

Conference	Danish Optical Society Annual Meeting
Period	01/01/2005 → …

Cite this

Olsen, B. B., Schøler, M., Schmidt, M. S., Bøggild, P., Kristensen, A., Shi, P., Hagedorn Frandsen, L., & Borel, P. I. (2005). High Pattern Density Nanoimprint Lithography Stamps Fabricated by Means of Negative Electron Beam Lithography Resist and dry Etching in Silicon. Poster session presented at Danish Optical Society Annual Meeting, .

Olsen, Brian Bilenberg ; Schøler, Mikkel ; Schmidt, Michael Stenbæk ; Bøggild, Peter ; Kristensen, Anders ; Shi, P. ; Hagedorn Frandsen, L. ; Borel, P. I. / High Pattern Density Nanoimprint Lithography Stamps Fabricated by Means of Negative Electron Beam Lithography Resist and dry Etching in Silicon. Poster session presented at Danish Optical Society Annual Meeting, .

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title = "High Pattern Density Nanoimprint Lithography Stamps Fabricated by Means of Negative Electron Beam Lithography Resist and dry Etching in Silicon",

author = "Olsen, {Brian Bilenberg} and Mikkel Sch{\o}ler and Schmidt, {Michael Stenb{\ae}k} and Peter B{\o}ggild and Anders Kristensen and P. Shi and {Hagedorn Frandsen}, L. and Borel, {P. I.}",

year = "2005",

language = "English",

note = "Danish Optical Society Annual Meeting ; Conference date: 01-01-2005",

}

High Pattern Density Nanoimprint Lithography Stamps Fabricated by Means of Negative Electron Beam Lithography Resist and dry Etching in Silicon. / Olsen, Brian Bilenberg; Schøler, Mikkel; Schmidt, Michael Stenbæk; Bøggild, Peter ; Kristensen, Anders; Shi, P.; Hagedorn Frandsen, L.; Borel, P. I.

2005. Poster session presented at Danish Optical Society Annual Meeting, .

Research output: Contribution to conference › Poster › Research

TY - CONF

T1 - High Pattern Density Nanoimprint Lithography Stamps Fabricated by Means of Negative Electron Beam Lithography Resist and dry Etching in Silicon

AU - Olsen, Brian Bilenberg

AU - Schøler, Mikkel

AU - Schmidt, Michael Stenbæk

AU - Bøggild, Peter

AU - Kristensen, Anders

AU - Shi, P.

AU - Hagedorn Frandsen, L.

AU - Borel, P. I.

PY - 2005

Y1 - 2005

M3 - Poster

T2 - Danish Optical Society Annual Meeting

Y2 - 1 January 2005

ER -