High Pattern Density Nanoimprint Lithography Stamps Fabricated by Means of Negative Electron Beam Lithography Resist and dry Etching in Silicon

Brian Bilenberg Olsen; Mikkel Schøler; Michael Stenbæk Schmidt; Peter Bøggild; Anders Kristensen; P. Shi; L. Hagedorn Frandsen; P. I. Borel

High Pattern Density Nanoimprint Lithography Stamps Fabricated by Means of Negative Electron Beam Lithography Resist and dry Etching in Silicon

Brian Bilenberg Olsen, Mikkel Schøler, Michael Stenbæk Schmidt, Peter Bøggild, Anders Kristensen, P. Shi, L. Hagedorn Frandsen, P. I. Borel

Research output: Contribution to conference › Poster › Research

Original language	English
Publication date	2005
Publication status	Published - 2005
Event	2005 Annual Meeting of the Danish Optical Society - Risoe National Laboratory, Roskilde, Denmark Duration: 17 Nov 2005 → 18 Nov 2005

Conference

Conference	2005 Annual Meeting of the Danish Optical Society
Location	Risoe National Laboratory
Country/Territory	Denmark
City	Roskilde
Period	17/11/2005 → 18/11/2005

OpenUrl availability

Full text

Cite this

Olsen, B. B., Schøler, M., Schmidt, M. S., Bøggild, P., Kristensen, A., Shi, P., Hagedorn Frandsen, L., & Borel, P. I. (2005). High Pattern Density Nanoimprint Lithography Stamps Fabricated by Means of Negative Electron Beam Lithography Resist and dry Etching in Silicon. Poster session presented at 2005 Annual Meeting of the Danish Optical Society, Roskilde, Denmark.

@conference{a1e2678c13b8488fa40f80c1237d72e0,

title = "High Pattern Density Nanoimprint Lithography Stamps Fabricated by Means of Negative Electron Beam Lithography Resist and dry Etching in Silicon",

author = "Olsen, {Brian Bilenberg} and Mikkel Sch{\o}ler and Schmidt, {Michael Stenb{\ae}k} and Peter B{\o}ggild and Anders Kristensen and P. Shi and {Hagedorn Frandsen}, L. and Borel, {P. I.}",

year = "2005",

language = "English",

note = "2005 Annual Meeting of the Danish Optical Society ; Conference date: 17-11-2005 Through 18-11-2005",

}

High Pattern Density Nanoimprint Lithography Stamps Fabricated by Means of Negative Electron Beam Lithography Resist and dry Etching in Silicon. / Olsen, Brian Bilenberg; Schøler, Mikkel; Schmidt, Michael Stenbæk et al.
2005. Poster session presented at 2005 Annual Meeting of the Danish Optical Society, Roskilde, Denmark.

Research output: Contribution to conference › Poster › Research

TY - CONF

T1 - High Pattern Density Nanoimprint Lithography Stamps Fabricated by Means of Negative Electron Beam Lithography Resist and dry Etching in Silicon

AU - Olsen, Brian Bilenberg

AU - Schøler, Mikkel

AU - Schmidt, Michael Stenbæk

AU - Bøggild, Peter

AU - Kristensen, Anders

AU - Shi, P.

AU - Hagedorn Frandsen, L.

AU - Borel, P. I.

PY - 2005

Y1 - 2005

M3 - Poster

T2 - 2005 Annual Meeting of the Danish Optical Society

Y2 - 17 November 2005 through 18 November 2005

ER -