High Pattern Density Nanoimprint Lithography Stamps Fabricated by Means of Negative Electron Beam Lithography Resist and dry Etching in Silicon

Brian Bilenberg Olsen, Mikkel Schøler, Michael Stenbæk Schmidt, Peter Bøggild, Anders Kristensen, P. Shi, L. Hagedorn Frandsen, P. I. Borel

    Research output: Contribution to conferencePosterResearch

    Original languageEnglish
    Publication date2005
    Publication statusPublished - 2005
    Event2005 Annual Meeting of the Danish Optical Society - Risoe National Laboratory, Roskilde, Denmark
    Duration: 17 Nov 200518 Nov 2005

    Conference

    Conference2005 Annual Meeting of the Danish Optical Society
    LocationRisoe National Laboratory
    Country/TerritoryDenmark
    CityRoskilde
    Period17/11/200518/11/2005

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