High pattern density nanoimprint lithography stamps fabricated by means of negative electron beam lithography resist, TEBN-1, and dry etching in silicon

Brian Bilenberg Olsen, Mikkel Schøler, Michael Stenbæk Schmidt, Peixiong Shi, Peter Bøggild, Lars Hagedorn Frandsen, Peter Ingo Borel, Anders Kristensen

Research output: Contribution to conferencePosterResearchpeer-review

Original languageEnglish
Publication date2005
Publication statusPublished - 2005
EventThe 4th Internternational Conference on Nanoimprint and Nanoprint, NNT'05, 19 - 21 October - Nare, Japan
Duration: 1 Jan 2006 → …

Conference

ConferenceThe 4th Internternational Conference on Nanoimprint and Nanoprint, NNT'05, 19 - 21 October
CityNare, Japan
Period01/01/2006 → …

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