High pattern density nanoimprint lithography stamps fabricated by means of negative electron beam lithography resist, TEBN-1, and dry etching in silicon

Brian Bilenberg Olsen, Mikkel Schøler, Michael Stenbæk Schmidt, Peixiong Shi, Peter Bøggild, Lars Hagedorn Frandsen, Peter Ingo Borel, Anders Kristensen

    Research output: Contribution to conferencePosterResearchpeer-review

    Original languageEnglish
    Publication date2005
    Publication statusPublished - 2005
    EventThe 4th International Conference on Nanoimprint and Nanoprint - Nara, Japan
    Duration: 19 Oct 200521 Oct 2005
    Conference number: 4

    Conference

    ConferenceThe 4th International Conference on Nanoimprint and Nanoprint
    Number4
    Country/TerritoryJapan
    CityNara
    Period19/10/200521/10/2005

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