High molecular weight block copolymer lithography for nanofabrication of hard mask and photonic nanostructures

Sozaraj Rasappa*, Hanna Hulkkonen, Lars Schulte, Sokol Ndoni, Jarno Reuna, Turkka Salminen, Tapio Niemi

*Corresponding author for this work

Research output: Contribution to journalJournal articleResearchpeer-review

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