Abstract
| Original language | English |
|---|---|
| Title of host publication | Proceedings of 2014 Conference on Lasers and Electro-Optics (CLEO) |
| Number of pages | 2 |
| Publisher | IEEE |
| Publication date | 2014 |
| Pages | 1-2 |
| ISBN (Print) | 9781557529992 |
| Publication status | Published - 2014 |
| Event | 2014 CLEO Conference & Exhibition: Laser Science to Photonic Applications - San Jose Convention Center, San Jose, United States Duration: 8 Jun 2014 → 13 Jun 2014 Conference number: 34 |
Conference
| Conference | 2014 CLEO Conference & Exhibition |
|---|---|
| Number | 34 |
| Location | San Jose Convention Center |
| Country | United States |
| City | San Jose |
| Period | 08/06/2014 → 13/06/2014 |
Cite this
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High Excitation Efficiency of Channel Plasmon Polaritons in Tailored, UV-Lithography-Defined V-Grooves. / Smith, Cameron; Thilsted, Anil Haraksingh; Garcia-Ortiz, Cesar E.; Radko, I. P.; Marie, Rodolphe ; Jeppesen, Claus; Vannahme, Christoph; Bozhevolnyi, S. I.; Kristensen, Anders.
Proceedings of 2014 Conference on Lasers and Electro-Optics (CLEO). IEEE, 2014. p. 1-2.Research output: Chapter in Book/Report/Conference proceeding › Article in proceedings › Research › peer-review
TY - GEN
T1 - High Excitation Efficiency of Channel Plasmon Polaritons in Tailored, UV-Lithography-Defined V-Grooves
AU - Smith, Cameron
AU - Thilsted, Anil Haraksingh
AU - Garcia-Ortiz, Cesar E.
AU - Radko, I. P.
AU - Marie, Rodolphe
AU - Jeppesen, Claus
AU - Vannahme, Christoph
AU - Bozhevolnyi, S. I.
AU - Kristensen, Anders
PY - 2014
Y1 - 2014
N2 - We demonstrate >50% conversion of light to V-groove channel plasmon-polaritons (CPPs) via compact waveguide-termination mirrors. Devices are fabricated using UV-lithography and crystallographic silicon etching. The V-shape is tailored by thermal oxidation to support confined CPPs.
AB - We demonstrate >50% conversion of light to V-groove channel plasmon-polaritons (CPPs) via compact waveguide-termination mirrors. Devices are fabricated using UV-lithography and crystallographic silicon etching. The V-shape is tailored by thermal oxidation to support confined CPPs.
M3 - Article in proceedings
SN - 9781557529992
SP - 1
EP - 2
BT - Proceedings of 2014 Conference on Lasers and Electro-Optics (CLEO)
PB - IEEE
ER -