Height patterning of nanostructured surfaces with a focused helium ion beam: a precise and gentle non-sputtering method

L. Tavares*, S. Chiriaev, V Adashkevich, Rafael J. Taboryski, H.-G. Rubahn

*Corresponding author for this work

Research output: Contribution to journalJournal articleResearchpeer-review

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Abstract

This work presents a new technique for surface patterning with focused ion beams. The technique is based on chemical decomposition in the bulk of a polymer substrate with negligible surface sputtering effects. By using a focused helium ion beam, generated in a helium ion microscope, we show that the surface height of polymethyl methacrylate substrates can be patterned with nanometer depth precision, while preserving the essential features of the nanostructures prefabricated on this surface. The key factors that control this patterning process are discussed.
Original languageEnglish
Article number145303
JournalNanotechnology
Volume31
Issue number14
Number of pages6
ISSN0957-4484
DOIs
Publication statusPublished - 2020

Keywords

  • Helium focused ion beam
  • Surface height nanopatterning
  • Direct patterning

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