Hard graphitelike hydrogenated amorphous carbon grown at high rates by a remote plasma

Shailendra Vikram Singh, T. Zaharia, M. Creatore, M.C.M. Van De Sanden, R. Groenen, K. Van Hege

    Research output: Contribution to journalJournal articleResearchpeer-review

    Abstract

    Hydrogenated amorphous carbon (a-C:H) deposited from an Ar-C 2H2 expanding thermal plasma chemical vapor deposition (ETP-CVD) is reported. The downstream plasma region of an ETP is characterized by a low electron temperature (∼0.3 eV), which leads to an ion driven chemistry and negligible physical effects, such as ion bombardment (ion energy
    Original languageEnglish
    JournalJournal of Applied Physics
    Volume107
    Issue number1
    Pages (from-to)013305
    ISSN0021-8979
    DOIs
    Publication statusPublished - 2010

    Keywords

    • Plasma processing
    • Fusion energy

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