Hard graphitelike hydrogenated amorphous carbon grown at high rates by a remote plasma

Shailendra Vikram Singh; T. Zaharia; M. Creatore; M.C.M. Van De Sanden; R. Groenen; K. Van Hege

doi:10.1063/1.3273412

Hard graphitelike hydrogenated amorphous carbon grown at high rates by a remote plasma

Shailendra Vikram Singh, T. Zaharia, M. Creatore, M.C.M. Van De Sanden, R. Groenen, K. Van Hege

Research output: Contribution to journal › Journal article › Research › peer-review

Abstract

Hydrogenated amorphous carbon (a-C:H) deposited from an Ar-C 2H2 expanding thermal plasma chemical vapor deposition (ETP-CVD) is reported. The downstream plasma region of an ETP is characterized by a low electron temperature (∼0.3 eV), which leads to an ion driven chemistry and negligible physical effects, such as ion bombardment (ion energy

Original language	English
Journal	Journal of Applied Physics
Volume	107
Issue number	1
Pages (from-to)	013305
ISSN	0021-8979
DOIs	https://doi.org/10.1063/1.3273412
Publication status	Published - 2010

Keywords

Plasma processing
Fusion energy

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10.1063/1.3273412

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title = "Hard graphitelike hydrogenated amorphous carbon grown at high rates by a remote plasma",

abstract = "Hydrogenated amorphous carbon (a-C:H) deposited from an Ar-C 2H2 expanding thermal plasma chemical vapor deposition (ETP-CVD) is reported. The downstream plasma region of an ETP is characterized by a low electron temperature (∼0.3 eV), which leads to an ion driven chemistry and negligible physical effects, such as ion bombardment (ion energy ",

keywords = "Plasma processing, Fusion energy, Fusionsenergi, Plasmaprocessering",

author = "Singh, {Shailendra Vikram} and T. Zaharia and M. Creatore and {Van De Sanden}, M.C.M. and R. Groenen and {Van Hege}, K.",

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T1 - Hard graphitelike hydrogenated amorphous carbon grown at high rates by a remote plasma

AU - Singh, Shailendra Vikram

AU - Zaharia, T.

AU - Creatore, M.

AU - Van De Sanden, M.C.M.

AU - Groenen, R.

AU - Van Hege, K.

PY - 2010

Y1 - 2010

N2 - Hydrogenated amorphous carbon (a-C:H) deposited from an Ar-C 2H2 expanding thermal plasma chemical vapor deposition (ETP-CVD) is reported. The downstream plasma region of an ETP is characterized by a low electron temperature (∼0.3 eV), which leads to an ion driven chemistry and negligible physical effects, such as ion bombardment (ion energy

AB - Hydrogenated amorphous carbon (a-C:H) deposited from an Ar-C 2H2 expanding thermal plasma chemical vapor deposition (ETP-CVD) is reported. The downstream plasma region of an ETP is characterized by a low electron temperature (∼0.3 eV), which leads to an ion driven chemistry and negligible physical effects, such as ion bombardment (ion energy

KW - Plasma processing

KW - Fusion energy

KW - Fusionsenergi

KW - Plasmaprocessering

U2 - 10.1063/1.3273412

DO - 10.1063/1.3273412

M3 - Journal article

SN - 0021-8979

VL - 107

SP - 013305

JO - Journal of Applied Physics

JF - Journal of Applied Physics

IS - 1

ER -

Hard graphitelike hydrogenated amorphous carbon grown at high rates by a remote plasma

Abstract

Keywords

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