Hall effect measurement for precise sheet resistance and thickness evaluation of Ruthenium thin films using non-equidistant four-point probes

Frederik Westergaard Østerberg, Maria-Louise Witthøft, Shibesh Dutta, Johan Meersschaut, Christoph Adelmann, Peter Folmer Nielsen, Ole Hansen, Dirch Hjorth Petersen*

*Corresponding author for this work

Research output: Contribution to journalJournal articleResearchpeer-review

339 Downloads (Pure)

Abstract

We present a new micro Hall effect measurement method using non-equidistant electrodes. We show theoretically and verify experimentally that it is advantageous to use non-equidistant electrodes for samples with low Hall sheet resistance. We demonstrate the new method by experiments where Hall sheet carrier densities and Hall mobilities of Ruthenium thin films (3-30 nm) are determined. The measurements show that it is possible to measure Hall mobilities as low as 1 cm2V1s1 with a relative standard deviation of 2-3%. We show a linear relation between measured Hall sheet carrier density and film thickness. Thus, the method can be used to monitor thickness variations of ultra-thin metal films.
Original languageEnglish
Article number055206
JournalA I P Advances
Volume8
Issue number5
Number of pages7
ISSN2158-3226
DOIs
Publication statusPublished - 2018

Bibliographical note

© 2018 Author(s). All article content, except where otherwise noted, is licensed under a Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/).

Cite this